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Jonathan R. Bakke
Jonathan R. Bakke
Stanford University, Applied Materials, ASM
Verified email at alumni.stanford.edu
Title
Cited by
Cited by
Year
Nanoengineering and interfacial engineering of photovoltaics by atomic layer deposition
JR Bakke, KL Pickrahn, TP Brennan, SF Bent
Nanoscale 3 (9), 3482-3508, 2011
2072011
Effects of self-assembled monolayers on solid-state CdS quantum dot sensitized solar cells
P Ardalan, TP Brennan, HBR Lee, JR Bakke, IK Ding, MD McGehee, ...
ACS nano 5 (2), 1495-1504, 2011
1252011
Atomic layer deposition of ZnS via in situ production of H2S
JR Bakke, JS King, HJ Jung, R Sinclair, SF Bent
Thin solid films 518 (19), 5400-5408, 2010
932010
Atomic Layer Deposition of CdS Quantum Dots for Solid‐State Quantum Dot Sensitized Solar Cells
TP Brennan, P Ardalan, HBR Lee, JR Bakke, IK Ding, MD McGehee, ...
Advanced Energy Materials 1 (6), 1169-1175, 2011
892011
Electron enrichment in 3d transition metal oxide hetero-nanostructures
CX Kronawitter, JR Bakke, DA Wheeler, WC Wang, C Chang, BR Antoun, ...
Nano letters 11 (9), 3855-3861, 2011
872011
Atomic layer deposition of CdS films
JR Bakke, HJ Jung, JT Tanskanen, R Sinclair, SF Bent
Chemistry of Materials 22 (16), 4669-4678, 2010
802010
Cobalt fill for advanced interconnects
N Bekiaris, Z Wu, H Ren, M Naik, JH Park, M Lee, TH Ha, W Hou, ...
2017 IEEE international interconnect technology conference (IITC), 1-3, 2017
702017
Growth characteristics, material properties, and optical properties of zinc oxysulfide films deposited by atomic layer deposition
JR Bakke, JT Tanskanen, C Hägglund, TA Pakkanen, SF Bent
Journal of Vacuum Science & Technology A 30 (1), 2012
612012
TiO 2-SnO 2: F interfacial electronic structure investigated by soft x-ray absorption spectroscopy
CX Kronawitter, M Kapilashrami, JR Bakke, SF Bent, CH Chuang, ...
Physical Review B 85 (12), 125109, 2012
572012
Influence of organozinc ligand design on growth and material properties of ZnS and ZnO deposited by atomic layer deposition
JT Tanskanen, JR Bakke, TA Pakkanen, SF Bent
Journal of Vacuum Science & Technology A 29 (3), 2011
552011
ALD growth characteristics of ZnS films deposited from organozinc and hydrogen sulfide precursors
JT Tanskanen, JR Bakke, SF Bent, TA Pakkanen
Langmuir 26 (14), 11899-11906, 2010
502010
The importance of dye chemistry and TiCl 4 surface treatment in the behavior of Al 2 O 3 recombination barrier layers deposited by atomic layer deposition in solid-state dye …
TP Brennan, JR Bakke, IK Ding, BE Hardin, WH Nguyen, R Mondal, ...
Physical Chemistry Chemical Physics 14 (35), 12130-12140, 2012
402012
TiO2 Conduction Band Modulation with In2O3 Recombination Barrier Layers in Solid-State Dye-Sensitized Solar Cells
TP Brennan, JT Tanskanen, KE Roelofs, JWF To, WH Nguyen, JR Bakke, ...
The Journal of Physical Chemistry C 117 (46), 24138-24149, 2013
392013
Atomic layer deposition of Cd x Zn 1− x S films
JR Bakke, JT Tanskanen, HJ Jung, R Sinclair, SF Bent
Journal of Materials Chemistry 21 (3), 743-751, 2011
302011
Atomic layer deposition of CdO and CdxZn1− xO films
JR Bakke, C Hägglund, HJ Jung, R Sinclair, SF Bent
Materials Chemistry and Physics 140 (2-3), 465-471, 2013
202013
Dynamical Orientation of Large Molecules on Oxide Surfaces and its Implications for Dye-Sensitized Solar Cells
TP Brennan, JT Tanskanen, JR Bakke, WH Nguyen, D Nordlund, ...
Chemistry of Materials 25 (21), 4354-4363, 2013
182013
Molecular level insights into atomic layer deposition of CdS by quantum chemical calculations
JT Tanskanen, JR Bakke, SF Bent, TA Pakkanen
The Journal of Physical Chemistry C 114 (39), 16618-16624, 2010
172010
Fluorine-free tungsten films as low resistance liners for tungsten fill applications
J Bakke, Y Lei, Y Xu, K Daito, X Fu, G Jian, K Wu, R Hung, R Jakkaraju, ...
2016 IEEE International Interconnect Technology Conference/Advanced …, 2016
162016
Process for in situ generation of hydrogen sulfide or hydrogen selenide gas using a solid precursor
S Bent, JS King, JR Bakke
US Patent App. 12/641,664, 2010
152010
Methods for forming low-resistance contacts through integrated process flow systems
Y Lei, V Banthia, K Wu, X Fu, Y Xu, K Daito, F Ma, P Agarwal, CC Lin, ...
US Patent 9,947,578, 2018
142018
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