Seong Keun Kim
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Resistive switching mechanism of thin films grown by atomic-layer deposition
BJ Choi, DS Jeong, SK Kim, C Rohde, S Choi, JH Oh, HJ Kim, CS Hwang, ...
Journal of applied physics 98 (3), 033715, 2005
High dielectric constant thin films on a Ru electrode grown at 250 C by atomic-layer deposition
SK Kim, WD Kim, KM Kim, CS Hwang, J Jeong
Applied Physics Letters 85 (18), 4112-4114, 2004
Al‐Doped TiO2 Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors
SK Kim, GJ Choi, SY Lee, M Seo, SW Lee, JH Han, HS Ahn, S Han, ...
Advanced Materials 20 (8), 1429-1435, 2008
First-principles study of point defects in rutile
E Cho, S Han, HS Ahn, KR Lee, SK Kim, CS Hwang
Physical Review B 73 (19), 193202, 2006
Capacitors with an equivalent oxide thickness of< 0.5 nm for nanoscale electronic semiconductor memory
SK Kim, SW Lee, JH Han, B Lee, S Han, CS Hwang
Advanced Functional Materials 20 (18), 2989-3003, 2010
Comparison between ZnO films grown by atomic layer deposition using H2O or O3 as oxidant
SK Kim, CS Hwang, SHK Park, SJ Yun
Thin Solid Films 478 (1-2), 103-108, 2005
Low temperature (< 100 C) deposition of aluminum oxide thin films by ALD with O3 as oxidant
SK Kim, SW Lee, CS Hwang, YS Min, JY Won, J Jeong
Journal of The Electrochemical Society 153 (5), F69, 2006
Atomic Layer Deposition for Semiconductors
CS Hwang
Atomic Layer Deposition for Semiconductors, E1-E1, 2014
Wafer-scale growth of MoS 2 thin films by atomic layer deposition
JJ Pyeon, SH Kim, DS Jeong, SH Baek, CY Kang, JS Kim, SK Kim
Nanoscale 8 (20), 10792-10798, 2016
Atomic Layer Deposition of SrTiO3 Thin Films with Highly Enhanced Growth Rate for Ultrahigh Density Capacitors
SW Lee, JH Han, S Han, W Lee, JH Jang, M Seo, SK Kim, C Dussarrat, ...
Chemistry of Materials 23 (8), 2227-2236, 2011
Giant electrode effect on tunnelling electroresistance in ferroelectric tunnel junctions
R Soni, A Petraru, P Meuffels, O Vavra, M Ziegler, SK Kim, DS Jeong, ...
Nature Communications 5 (1), 1-10, 2014
Atomic layer deposition of Ru thin films using 2, 4-(dimethylpentadienyl)(ethylcyclopentadienyl) Ru by a liquid injection system
SK Kim, SY Lee, SW Lee, GW Hwang, CS Hwang, JW Lee, J Jeong
Journal of The Electrochemical Society 154 (2), D95, 2007
Plasma-enhanced atomic layer deposition of TiO2 and Al-doped TiO2 films using N2O and O2 reactants
GJ Choi, SK Kim, SJ Won, HJ Kim, CS Hwang
Journal of the Electrochemical Society 156 (9), G138, 2009
Titanium dioxide thin films for next-generation memory devices
SK Kim, KM Kim, DS Jeong, W Jeon, KJ Yoon, CS Hwang
Journal of Materials Research 28 (3), 313, 2013
Growth characteristics of atomic layer deposited TiO2 thin films on Ru and Si electrodes for memory capacitor applications
WD Kim, GW Hwang, OS Kwon, SK Kim, M Cho, DS Jeong, SW Lee, ...
Journal of The Electrochemical Society 152 (8), C552, 2005
Atomic-layer-deposited Al2O3 thin films with thin SiO2 layers grown by in situ O3 oxidation
SK Kim, CS Hwang
Journal of applied physics 96 (4), 2323-2329, 2004
Growth Behavior of Al-Doped TiO2 Thin Films by Atomic Layer Deposition
SK Kim, GJ Choi, JH Kim, CS Hwang
Chemistry of Materials 20 (11), 3723-3727, 2008
Transformation of the crystalline structure of an ALD TiO2 film on a Ru electrode by O3 pretreatment
SK Kim, GW Hwang, WD Kim, CS Hwang
Electrochemical and solid-state letters 9 (1), F5, 2005
Chemically conformal ALD of SrTiO3 thin films using conventional metallorganic precursors
OS Kwon, SK Kim, M Cho, CS Hwang, J Jeong
Journal of the Electrochemical Society 152 (4), C229, 2005
Growth and characterization of conducting ZnO thin films by atomic layer deposition
YS Min, CJ An, SK Kim, JW Song, CS Hwang
Bulletin of the Korean Chemical Society 31 (9), 2503-2508, 2010
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Articles 1–20