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Xin Meng
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Atomic Layer Deposition of Silicon Nitride Thin Films: A Review of Recent Progress, Challenges, and Outlooks
X Meng, YC Byun, HS Kim, JS Lee, AT Lucero, L Cheng, J Kim
Materials 9 (12), 1007, 2016
952016
Low temperature synthesis of graphite on Ni films using inductively coupled plasma enhanced CVD
L Cheng, K Yun, A Lucero, J Huang, X Meng, G Lian, HS Nam, ...
Journal of Materials Chemistry C 3 (20), 5192-5198, 2015
352015
Sensitivity gains in chemosensing by optical and structural modulation of ordered assembly arrays of ZnO nanorods
D Zhu, Q He, Q Chen, Y Fu, C He, L Shi, X Meng, C Deng, H Cao, ...
ACS nano 5 (6), 4293-4299, 2011
302011
Hierarchical Porous Carbon Arising from Metal–Organic Framework-Encapsulated Bacteria and Its Energy Storage Potential
S Li, Xiaoshuang, ZZ Chen, FC Herbert, R Jayawickramage, ...
ACS Appl. Mater. Interfaces 12 (10), 11884-11889, 2020
242020
Hollow Cathode Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using Pentachlorodisilane
X Meng, HS Kim, AT Lucero, SM Hwang, JS Lee, YC Byun, J Kim, ...
ACS Appl. Mater. Interfaces 10 (16), 14116−14123, 2018
222018
Investigation of the Physical Properties of Plasma Enhanced Atomic Layer Deposited Silicon Nitride as Etch Stopper
HS Kim, X Meng, SJ Kim, AT Lucero, L Cheng, YC Byun, JS Lee, ...
ACS applied materials & interfaces 10 (51), 44825–44833, 2018
202018
Robust SiNx/GaN MIS-HEMTs With Crystalline Interfacial Layer Using Hollow Cathode PEALD
X Meng, J Lee, AV Ravichandran, YC Byun, JG Lee, A Lucero, SJ Kim, ...
IEEE Electron Device Letters 39 (8), 1195-1198, 2018
82018
Low temperature (100 C) atomic layer deposited-ZrO2 for recessed gate GaN HEMTs on Si
YC Byun, JG Lee, X Meng, JS Lee, AT Lucero, SJ Kim, CD Young, MJ Kim, ...
Applied Physics Letters 111 (8), 082905, 2017
82017
A novel chemosensor-bipyridyl end capped hyperbranched conjugated polymer
X Meng, QG He, HM Cao, JG Cheng
Chinese Chemical Letters 22 (6), 725-728, 2011
72011
High growth rate and high wet etch resistance silicon nitride grown by low temperature plasma enhanced atomic layer deposition with a novel silylamine precursor
HS Kim, SM Hwang, X Meng, YC Byun, YC Jung, AV Ravichandran, ...
Journal of Materials Chemistry C 8 (37), 13033-13039, 2020
62020
Hollow Cathode Plasma (HCP) Enhanced Atomic Layer Deposition of Silicon Nitride (SiNx) Thin Films Using Pentachlorodisilane (PCDS)
SM Hwang, ALN Kondusamy, Z Qin, HS Kim, X Meng, J Kim, BK Hwang, ...
ECS Transactions 89 (3), 63, 2019
42019
From Biomimetic Mineralization to Carbonization: Fabricating Heterostructured Porous Carbon Materials with MOF Encapsulated Bacteria
S Li, X Zhou, Z Chen, R Jayawickramage, SB Alahakoon, X Meng, ...
2019
Low Temperature Thermal ALD of Silicon Nitride Utilizing a Novel High Purity Hydrazine Source
D Alvarez, K Andachi, AT Lucero, A Kondusamy, SM Hwang, X Meng, ...
ECS Meeting Abstracts, 993, 2018
2018
High Mobility III-V Semiconductor Devices with Gate Dielectrics and Passivation Layers Grown by Atomic Layer Deposition
X Meng
The University of Texas at Dallas, 2018
2018
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Articles 1–14