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H.Jörg Osten
H.Jörg Osten
Verified email at mbe.uni-hannover.de
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Cited by
Year
High-k gate dielectrics with ultra-low leakage current based on praseodymium oxide
HJ Osten, JP Liu, P Gaworzewski, E Bugiel, P Zaumseil
International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No …, 2000
2042000
Growth of an inverse tetragonal distorted SiGe layer on Si (001) by adding small amounts of carbon
HJ Osten, E Bugiel, P Zaumseil
Applied physics letters 64 (25), 3440-3442, 1994
1941994
Theoretical aspects of isotope effects on nuclear shielding
CJ Jameson, H Osten
Annual Rep. NMR Spectrosc 17, 1-78, 1986
1851986
Suppressed diffusion of boron and carbon in carbon-rich silicon
H Rücker, B Heinemann, W Röpke, R Kurps, D Krüger, G Lippert, ...
Applied Physics Letters 73 (12), 1682-1684, 1998
1831998
Strain-stabilized highly concentrated pseudomorphic Si 1− x C x layers in Si
H Rücker, M Methfessel, E Bugiel, HJ Osten
Physical review letters 72 (22), 3578, 1994
1441994
Substitutional versus interstitial carbon incorporation during pseudomorphic growth of Si1−yCy on Si(001)
HJ Osten, M Kim, K Pressel, P Zaumseil
Journal of Applied Physics 80 (12), 6711-6715, 1996
1391996
Epitaxial growth of on Si(111) and the observation of a hexagonal to cubic phase transition during postgrowth annealing
JP Liu, P Zaumseil, E Bugiel, HJ Osten
Applied Physics Letters 79 (5), 671-673, 2001
1352001
Photoemission and ab initio theoretical study of interface and film formation during epitaxial growth and annealing of praseodymium oxide on Si(001)
A Fissel, J Dabrowski, HJ Osten
Journal of applied physics 91 (11), 8986-8991, 2002
1312002
Band gap and band discontinuities at crystalline heterojunctions
HJ Osten, JP Liu, HJ Müssig
Applied physics letters 80 (2), 297-299, 2002
1302002
Growth and properties of strained Si1-x-yGexCy layers
SC Jain, HJ Osten, B Dietrich, H Rucker
Semiconductor science and technology 10 (10), 1289, 1995
1301995
Interface formation during molecular beam epitaxial growth of neodymium oxide on silicon
A Fissel, Z Elassar, O Kirfel, E Bugiel, M Czernohorsky, HJ Osten
Journal of applied Physics 99 (7), 2006
1272006
Impact of oxygen supply during growth on the electrical properties of crystalline Gd2O3 thin films on Si (001)
M Czernohorsky, E Bugiel, HJ Osten, A Fissel, O Kirfel
Applied Physics Letters 88 (15), 2006
1202006
Surfactant-controlled solid phase epitaxy of germanium on silicon
HJ Osten, J Klatt, G Lippert, B Dietrich, E Bugiel
Physical review letters 69 (3), 450, 1992
1151992
Introducing crystalline rare‐earth oxides into Si technologies
HJ Osten, A Laha, M Czernohorsky, E Bugiel, R Dargis, A Fissel
physica status solidi (a) 205 (4), 695-707, 2008
1062008
Epitaxial praseodymium oxide: a new high-k dielectric
HJ Osten, E Bugiel, A Fissel, T Guminskaya, JP Liu, HJ Mussig, ...
Extended Abstracts of International Workshop on Gate Insulator. IWGI 2001 …, 2001
942001
Measurement of stress and relaxation in Si1−xGex layers by Raman line shift and x‐ray diffraction
B Dietrich, E Bugiel, J Klatt, G Lippert, T Morgenstern, HJ Osten, ...
Journal of applied physics 74 (5), 3177-3180, 1993
911993
Lattice distortion in a strain-compensated Si 1− x− y Ge x C y layer on silicon
B Dietrich, HJ Osten, H Rücker, M Methfessel, P Zaumseil
Physical Review B 49 (24), 17185, 1994
881994
Towards understanding epitaxial growth of alternative high- dielectrics on Si(001): Application to praseodymium oxide
A Fissel, HJ Osten, E Bugiel
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2003
872003
Improvement of the SRH bulk lifetime upon formation of n-type POLO junctions for 25% efficient Si solar cells
J Krügener, F Haase, M Rienäcker, R Brendel, HJ Osten, R Peibst
Solar Energy Materials and Solar Cells 173, 85-91, 2017
852017
Influence of interface layer composition on the electrical properties of epitaxial thin films for high- application
A Laha, HJ Osten, A Fissel
Applied Physics Letters 90 (11), 113508, 2007
852007
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