| Wafer-level 3D integration technology SJ Koester, AM Young, RR Yu, S Purushothaman, KN Chen, ... IBM Journal of Research and Development 52 (6), 583-597, 2008 | 230 | 2008 |
| Increasing proton exchange membrane fuel cell catalyst effectiveness through sputter deposition AT Haug, RE White, JW Weidner, W Huang, S Shi, T Stoner, N Rana Journal of The Electrochemical Society 149 (3), A280, 2002 | 164 | 2002 |
| A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM A Vaid, BB Yan, YT Jiang, M Kelling, C Hartig, J Allgair, P Ebersbach, ... Metrology, Inspection, and Process Control for Microlithography XXV 7971, 21-40, 2011 | 74 | 2011 |
| Bilayer fibril formation by genetically engineered polypeptides: preparation and characterization NI Topilina, S Higashiya, N Rana, VV Ermolenkov, C Kossow, A Carlsen, ... Biomacromolecules 7 (4), 1104-1111, 2006 | 60 | 2006 |
| Programmable via using indirectly heated phase-change switch for reconfigurable logic applications KN Chen, L Krusin-Elbaum, DM Newns, BG Elmegreen, R Cheek, ... IEEE Electron Device Letters 29 (1), 131-133, 2007 | 55 | 2007 |
| Using sputter deposition to increase CO tolerance in a proton-exchange membrane fuel cell AT Haug, RE White, JW Weidner, W Huang, S Shi, N Rana, S Grunow, ... Journal of The Electrochemical Society 149 (7), A868, 2002 | 44 | 2002 |
| 3D-AFM enhancement for CD metrology dedicated to lithography sub-28-nm node requirements J Foucher, N Rana, C Dezauzier Metrology, Inspection, and Process Control for Microlithography XXIV 7638, 21-35, 2010 | 35 | 2010 |
| Leveraging advanced data analytics, machine learning, and metrology models to enable critical dimension metrology solutions for advanced integrated circuit nodes N Rana, Y Zhang, T Kagalwala, T Bailey Journal of Micro/Nanolithography, MEMS, and MOEMS 13 (4), 041415-041415, 2014 | 28 | 2014 |
| Holistic metrology approach: hybrid metrology utilizing scatterometry, critical dimension-atomic force microscope and critical dimension-scanning electron microscope A Vaid, BB Yan, YT Jiang, M Kelling, C Hartig, J Allgair, P Ebersbach, ... Journal of Micro/Nanolithography, MEMS and MOEMS 10 (4), 043016-043016-13, 2011 | 26 | 2011 |
| Ion detector for ion beam applications SB Herschbein, N Rana, C Rue, MR Sievers US Patent 7,119,333, 2006 | 25 | 2006 |
| Hybrid reference metrology exploiting patterning simulation N Rana, C Archie Metrology, Inspection, and Process Control for Microlithography XXIV 7638 …, 2010 | 24 | 2010 |
| The measurement uncertainty challenge of advanced patterning development N Rana, C Archie, W Lu, B Banke Metrology, Inspection, and Process Control for Microlithography XXIII 7272 …, 2009 | 24 | 2009 |
| Hybrid metrology solution for 1X-node technology A Vaid, A Elia, M Kelling, J Allgair, C Hartig, P Ebersbach, E Mclellan, ... Metrology, Inspection, and Process Control for Microlithography XXVI 8324, 43-64, 2012 | 21 | 2012 |
| Time-dependent electron-beam-induced photoresist shrinkage effects B Bunday, A Cordes, C Hartig, J Allgair, A Vaid, E Solecky, N Rana Journal Of Micro/Nanolithography, MEMS, and MOEMS 11 (2), 023007-023007, 2012 | 21 | 2012 |
| Automated hybrid metrology for semiconductor device fabrication A Vaid, NR Saleh, MJ Sendelbach, NN Rana US Patent 9,330,985, 2016 | 12 | 2016 |
| Reconciling measurements in AFM reference metrology when using different probing techniques N Rana, C Archie, J Foucher Metrology, Inspection, and Process Control for Microlithography XXV 7971 …, 2011 | 12 | 2011 |
| Tool-to-tool matching issues due to photoresist shrinkage effects B Bunday, A Cordes, C Hartig, J Allgair, A Vaid, E Solecky, N Rana Metrology, Inspection, and Process Control for Microlithography XXV 7971, 96-112, 2011 | 11 | 2011 |
| High-resolution optical channel for non-destructive navigation and processing of integrated circuits HM Marchman, SB Herschbein, C Rue, M Renner, N Rana US Patent 7,351,966, 2008 | 9 | 2008 |
| Construction of low-dimensional assemblies of nanoparticles N Rana, ST Yau Nanotechnology 15, 275, 2004 | 9 | 2004 |
| Hybrid metrology for semiconductor devices A Vaid, NR Saleh, MJ Sendelbach, N Rana US Patent App. 13/365,920, 2013 | 7 | 2013 |
