| Electrically-driven optical proximity correction to compensate for non-optical effects KB Agarwal, S Banerjee, P Elakkumanan, LW Liebmann US Patent 8,103,983, 2012 | 126 | 2012 |
| ICCAD-2013 CAD contest in mask optimization and benchmark suite S Banerjee, Z Li, SR Nassif 2013 IEEE/ACM International Conference on Computer-Aided Design (ICCAD), 271-274, 2013 | 86 | 2013 |
| Fast lithographic mask optimization considering process variation YH Su, YC Huang, LC Tsai, YW Chang, S Banerjee IEEE Transactions on Computer-Aided Design of Integrated Circuits and …, 2016 | 52 | 2016 |
| A comparative study of wearable ultraviolet radiometers S Banerjee, EG Hoch, PD Kaplan, ELP Dumont 2017 IEEE Life Sciences Conference (LSC), 9-12, 2017 | 31 | 2017 |
| Electrically driven optical proximity correction S Banerjee, JA Culp, P Elakkumanan, LW Liebmann US Patent 7,865,864, 2011 | 31 | 2011 |
| Detecting hotspots using machine learning on diffraction patterns KB Agarwal, S Banerjee, P Pathak US Patent 9,626,459, 2017 | 28 | 2017 |
| Simultaneous photolithographic mask and target optimization KB Agarwal, S Banerjee, DA Jamsek US Patent 8,146,026, 2012 | 28 | 2012 |
| Electrically driven optical proximity correction based on linear programming S Banerjee, P Elakkumanan, LW Liebmann, M Orshansky 2008 IEEE/ACM International Conference on Computer-Aided Design, 473-479, 2008 | 28 | 2008 |
| Method for post decomposition density balancing in integrated circuit layouts, related system and program product KB Agarwal, S Banerjee, LW Liebmann US Patent 8,647,893, 2014 | 26 | 2014 |
| Machine learning approach to correct lithographic hot-spots KB Agarwal, S Banerjee US Patent 8,464,194, 2013 | 23 | 2013 |
| Model-based retargeting of layout patterns for sub-wavelength photolithography KB Agarwal, S Banerjee, SR Nassif US Patent 8,321,818, 2012 | 22 | 2012 |
| Electrically driven optical proximity correction S Banerjee, P Elakkumanan, LW Liebmann, JA Culp, M Orshansky Design for Manufacturability through Design-Process Integration II 6925, 536-544, 2008 | 22 | 2008 |
| Analyzing multiple induced systematic and statistical layout dependent effects on circuit performance S Banerjee, D Chidambarrao, JA Culp, P Elakkumanan, S Mukhopadhyay US Patent 8,176,444, 2012 | 21 | 2012 |
| Methods, systems, and apparatuses for accurate measurement and real-time feedback of solar ultraviolet exposure E Dumont, S Banerjee, M Contreras US Patent 9,880,052, 2018 | 19 | 2018 |
| Methods, systems, and apparatuses for accurate measurement and real-time feedback of solar ultraviolet exposure E Dumont, S Banerjee, M Contreras US Patent 10,527,490, 2020 | 17 | 2020 |
| Frequency domain layout decomposition in double patterning lithography KB Agarwal, S Banerjee US Patent 8,627,244, 2014 | 17 | 2014 |
| Methods, systems, and apparatuses for accurate measurement and real-time feedback of solar ultraviolet exposure E Dumont, S Banerjee, M Contreras US Patent 9,798,458, 2017 | 16 | 2017 |
| Pitch-aware multi-patterning lithography KB Agarwal, S Banerjee US Patent 8,689,151, 2014 | 16 | 2014 |
| SMATO: Simultaneous mask and target optimization for improving lithographic process window S Banerjee, KB Agarwal, M Orshansky 2010 IEEE/ACM International Conference on Computer-Aided Design (ICCAD), 100-106, 2010 | 15 | 2010 |
| Retargeting multiple patterned integrated circuit device designs KB Agarwal, S Banerjee US Patent 8,612,902, 2013 | 14 | 2013 |
