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Mingyan Wang
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The relationship between AlGaN barrier layer thickness and polarization Coulomb field scattering in AlGaN/GaN heterostructure field-effect transistors
G Jiang, Y Lv, Z Lin, Y Liu, M Wang, H Zhou
Superlattices and Microstructures 156, 106987, 2021
72021
Monte Carlo investigation of high-field electron transport properties in AlGaN/GaN HFETs
M Wang, Y Lv, Z Wen, H Zhou, P Cui, Z Lin
IEEE Electron Device Letters 43 (12), 2041-2044, 2022
62022
Study of electrical transport properties of GaN-based side-gate heterostructure transistors
H Zhou, Y Lv, M Wang, P Cui, Z Lin
Applied Physics Letters 121 (21), 2022
42022
A split-gate AlGaN/GaN heterostructure field-effect transistor with an auxiliary gate
Y Liu, Y Lv, H Zhou, Z Lin, Y Yang, G Jiang, Y Zhou, M Wang
AIP Advances 12 (2), 2022
32022
A Hybrid Simulation Technique to Investigate Bias-Dependent Electron Transport and Self-Heating in AlGaN/GaN HFETs
M Wang, Y Lv, H Zhou, Z Wen, P Cui, C Liu, Z Lin
IEEE Transactions on Electron Devices, 2023
22023
Influence of polarization Coulomb field scattering on the sub-60 mV/dec switching of AlGaN/GaN HFETs
Y Yang, Z Lin, M Wang, H Zhou, Y Liu, G Jiang
IEEE Transactions on Electron Devices 69 (1), 63-68, 2021
22021
Study on the frequency characteristics of split-gate AlGaN/GaN HFETs
H Zhou, Y Lv, Y Liu, M Wang, P Cui, Z Lin
Modern Physics Letters B 38 (12), 2450092, 2024
2024
Bias-dependent electron velocity and short-channel effect in scaling sub-100 nm InAlN/GaN HFETs
M Wang, H Zhou, C Liu, Z Lin, Y Zeng, P Cui
Applied Physics Letters 124 (15), 2024
2024
Study of electrical transport properties in split-gate AlGaN/GaN heterostructure field-effect transistors
H Zhou, Y Lv, C Liu, M Yang, Z Lin, Y Liu, M Wang
Solid-State Electronics 212, 108833, 2024
2024
Modeling of The Gate Bias-Dependent Velocity-Field Relationship and Physics-based Current-Voltage Characteristics in AlGaN/GaN HFETs
M Wang, Y Lv, H Zhou, P Cui, Z Lin
IEEE Access, 2024
2024
Bias-Dependent Electron Velocity Extracted From AlGaN/GaN HFETs and Its Impact on gm and fT
M Wang, Y Lv, H Zhou, P Cui, C Liu, Z Lin
IEEE Electron Device Letters, 2023
2023
Influence of the ZrO2 gate dielectric layer on polarization coulomb field scattering in InAlN/GaN metal–insulator–semiconductor high-electron-mobility transistors
G Jiang, P Cui, G Zhang, Y Zeng, G Yang, C Fu, Z Lin, M Wang, H Zhou
Microelectronics Journal 129, 105602, 2022
2022
Simulation of the effect of polarization Coulomb field scattering on device linearity in AlGaN/GaN heterostructure field effect transistors using the Monte Carlo method
Y Yang, Z Lin, M Wang, H Zhou, Y Liu, G Jiang
AIP Advances 11 (8), 2021
2021
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