Robert Hoekstra
Robert Hoekstra
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An overview of the Trilinos project
MA Heroux, RA Bartlett, VE Howle, RJ Hoekstra, JJ Hu, TG Kolda, ...
ACM Transactions on Mathematical Software (TOMS) 31 (3), 397-423, 2005
12412005
An overview of the Trilinos project
MA Heroux, RA Bartlett, VE Howle, RJ Hoekstra, JJ Hu, TG Kolda, ...
ACM Transactions on Mathematical Software (TOMS) 31 (3), 397-423, 2005
12412005
Two‐dimensional modeling of high plasma density inductively coupled sources for materials processing
PLG Ventzek, RJ Hoekstra, MJ Kushner
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1994
3991994
Two‐dimensional hybrid model of inductively coupled plasma sources for etching
PLG Ventzek, TJ Sommerer, RJ Hoekstra, MJ Kushner
Applied physics letters 63 (5), 605-607, 1993
1991993
Integrated plasma equipment model for polysilicon etch profiles in an inductively coupled plasma reactor with subwafer and superwafer topography
RJ Hoekstra, MJ Grapperhaus, MJ Kushner
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 15 (4 …, 1997
1221997
Microtrenching resulting from specular reflection during chlorine etching of silicon
RJ Hoekstra, MJ Kushner, V Sukharev, P Schoenborn
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1998
1211998
Predictions of ion energy distributions and radical fluxes in radio frequency biased inductively coupled plasma etching reactors
RJ Hoekstra, MJ Kushner
Journal of applied physics 79 (5), 2275-2286, 1996
851996
Performance of a parallel algebraic multilevel preconditioner for stabilized finite element semiconductor device modeling
PT Lin, JN Shadid, M Sala, RS Tuminaro, GL Hennigan, RJ Hoekstra
Journal of Computational Physics 228 (17), 6250-6267, 2009
672009
Spatial distributions of dust particles in plasmas generated by capacitively coupled radiofrequency discharges
SJ Choi, PLG Ventzek, RJ Hoekstra, MJ Kushner
Plasma Sources Science and Technology 3 (3), 418, 1994
611994
A parallel preconditioning strategy for efficient transistor-level circuit simulation
HK Thornquist, ER Keiter, RJ Hoekstra, DM Day, EG Boman
Proceedings of the 2009 International Conference on Computer-Aided Design …, 2009
482009
Xyce Parallel Electronic Simulator: users' guide.
ER Keiter, T Mei, TV Russo, EL Rankin, RL Schiek, HK Thornquist, ...
Sandia National Laboratories, 2012
41*2012
Comparison of two-dimensional and three-dimensional models for profile simulation of poly-Si etching of finite length trenches
RJ Hoekstra, MJ Kushner
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 16 (6 …, 1998
341998
The xyce™ parallel electronic simulator–an overview
S Hutchinson, E Keiter, R Hoekstra, H Watts, A Waters, T Russo, ...
Parallel Computing: Advances and Current Issues, 165-172, 2002
322002
Redesigning the WARPED simulation kernel for analysis and application development
DE Martin, PA Wilsey, RJ Hoekstra, ER Keiter, SA Hutchinson, TV Russo, ...
36th Annual Simulation Symposium, 2003., 216-223, 2003
292003
Large-scale transient sensitivity analysis of a radiation-damaged bipolar junction transistor via automatic differentiation
ET Phipps, RA Bartlett, DM Gay, RJ Hoekstra
Advances in automatic differentiation, 351-362, 2008
282008
Trilinos home page
MA Heroux, RA Bartlett, VE Howle, RJ Hoekstra, JJ Hu, TG Kolda, ...
Go online to http://software. sandia. gov/trilinos, 2004
242004
Parallel transistor-level circuit simulation
ER Keiter, HK Thornquist, RJ Hoekstra, TV Russo, RL Schiek, EL Rankin
Simulation and Verification of Electronic and Biological Systems, 1-21, 2011
232011
The effect of subwafer dielectrics on plasma properties in plasma etching reactors
RJ Hoekstra, MJ Kushner
Journal of applied physics 77 (8), 3668-3673, 1995
231995
Integrating multiple parallel simulation engines for mixed-technology parallel simulation
DE Martin, PA Wilsey, RJ Hoekstra, ER Keiter, SA Hutchinson, TV Russo, ...
Proceedings 35th Annual Simulation Symposium. SS 2002, 45-52, 2002
202002
Simulation of neutron radiation damage in silicon semiconductor devices
GL Hennigan, RJ Hoekstra, JP Castro, DA Fixel, JN Shadid
Sandia National Laboratories, Tech. Rep. SAND2007-7157, 2007
192007
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