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Katie Pickrahn Nardi
Katie Pickrahn Nardi
Lam Research, Stanford University
Verified email at stanford.edu
Title
Cited by
Cited by
Year
Active MnOx Electrocatalysts Prepared by Atomic Layer Deposition for Oxygen Evolution and Oxygen Reduction Reactions
KL Pickrahn, SW Park, Y Gorlin, HBR Lee, TF Jaramillo, SF Bent
Advanced Energy Materials 2 (10), 1269-1277, 2012
3492012
Creating highly active atomic layer deposited NiO electrocatalysts for the oxygen evolution reaction
KL Nardi, N Yang, CF Dickens, AL Strickler, SF Bent
Advanced Energy Materials 5 (17), 1500412, 2015
2602015
Nanoengineering and interfacial engineering of photovoltaics by atomic layer deposition
JR Bakke, KL Pickrahn, TP Brennan, SF Bent
Nanoscale 3 (9), 3482-3508, 2011
2062011
Methods for making euv patternable hard masks
C Wu, TW Weidman, KL Nardi
US Patent App. 15/733,598, 2021
1742021
Area-selective atomic layer deposition assisted by self-assembled monolayers: A comparison of Cu, Co, W, and Ru
D Bobb-Semple, KL Nardi, N Draeger, DM Hausmann, SF Bent
Chemistry of Materials 31 (5), 1635-1645, 2019
1602019
Nanoscale limitations in metal oxide electrocatalysts for oxygen evolution
V Viswanathan, KL Pickrahn, AC Luntz, SF Bent, JK Nørskov
Nano letters 14 (10), 5853-5857, 2014
772014
Improving area-selective molecular layer deposition by selective SAM removal
C Prasittichai, KL Pickrahn, FS Minaye Hashemi, DS Bergsman, SF Bent
ACS Applied Materials & Interfaces 6 (20), 17831-17836, 2014
642014
Applications of ALD MnO to electrochemical water splitting
KL Pickrahn, Y Gorlin, LC Seitz, A Garg, D Nordlund, TF Jaramillo, ...
Physical Chemistry Chemical Physics 17 (21), 14003-14011, 2015
542015
Effect of O3 on Growth of Pt by Atomic Layer Deposition
HBR Lee, KL Pickrahn, SF Bent
The Journal of Physical Chemistry C 118 (23), 12325-12332, 2014
522014
ALD of ultrathin ternary oxide electrocatalysts for water splitting
KL Pickrahn, A Garg, SF Bent
ACS Catalysis 5 (3), 1609-1616, 2015
462015
Formation and ripening of self-assembled multilayers from the vapor-phase deposition of dodecanethiol on copper oxide
DS Bergsman, TL Liu, RG Closser, KL Nardi, N Draeger, DM Hausmann, ...
Chemistry of materials 30 (16), 5694-5703, 2018
432018
Relationship between microstructure, dynamics, and rheology in polymer-bridging colloidal gels
K Pickrahn, B Rajaram, A Mohraz
Langmuir 26 (4), 2392-2400, 2010
322010
Effect of Multilayer versus Monolayer Dodecanethiol on Selectivity and Pattern Integrity in Area-Selective Atomic Layer Deposition
TL Liu, KL Nardi, N Draeger, DM Hausmann, SF Bent
ACS Applied Materials & Interfaces 12 (37), 42226-42235, 2020
312020
Characterizing self-assembled monolayer breakdown in area-selective atomic layer deposition
TL Liu, L Zeng, KL Nardi, DM Hausmann, SF Bent
Langmuir 37 (39), 11637-11645, 2021
192021
Lithographic performance of the first entirely dry process for EUV lithography
M Alvi, D Dries, R Gottscho, K Gu, B Kam, S Kanakasabapathy, D Li, ...
EUVL Workshop, 2020
42020
Interface engineering during MGO deposition for magnetic tunnel junctions
KL Nardi, NS Draeger
US Patent 9,988,715, 2018
22018
Methods for making hard masks useful in next-generation lithography
TW Weidman, K Nardi, C Wu
US Patent 11,921,427, 2024
12024
Selective etch using a sacrificial mask
D Peter, D Li, J Yu, A Kabansky, K Nardi, SSH Tan, Y Lee
US Patent App. 17/428,560, 2022
2022
(Invited) Challenges and Opportunities for Selective Area Processing in High Volume Manufacturing (HVM)
K Sharma, P Lemaire, K Nardi, D Hausmann
Electrochemical Society Meeting Abstracts 236, 1140-1140, 2019
2019
Approaches to atomic-scale engineering through selective processes
K Nardi, N Draeger, D Hausmann, D Smith
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY 255, 2018
2018
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