| Highly stable hydrophilic surfaces of PDMS thin layer obtained by UV radiation and oxygen plasma treatments C de Menezes Atayde, I Doi physica status solidi c 7 (2), 189-192, 2010 | 91 | 2010 |
| Titanium nitride as electrode for MOS technology and Schottky diode: Alternative extraction method of titanium nitride work function L Lima, JA Diniz, I Doi, JG Fo Microelectronic Engineering 92, 86-90, 2012 | 85 | 2012 |
| Electrical characterization and morphological properties of AlN films prepared by dc reactive magnetron sputtering MA Moreira, I Doi, JF Souza, JA Diniz Microelectronic Engineering 88 (5), 802-806, 2011 | 72 | 2011 |
| Micro-Raman stress characterization of polycrystalline silicon films grown at high temperature RC Teixeira, I Doi, MBP Zakia, JA Diniz, JW Swart Materials Science and Engineering: B 112 (2-3), 160-164, 2004 | 68 | 2004 |
| Thin titanium oxide films deposited by e-beam evaporation with additional rapid thermal oxidation and annealing for ISFET applications AD Barros, KF Albertin, J Miyoshi, I Doi, JA Diniz Microelectronic Engineering 87 (3), 443-446, 2010 | 56 | 2010 |
| Morphological studies of laser etching processes in self sustained CVD diamond wafers V Baranauskas, A Peled, VJ Trava-Airoldi, CAS Lima, I Doi, EJ Corat Applied surface science 79, 129-135, 1994 | 41 | 1994 |
| Silicon nitride deposited by ECR–CVD at room temperature for LOCOS isolation technology MA Pereira, JA Diniz, I Doi, JW Swart Applied surface science 212, 388-392, 2003 | 34 | 2003 |
| A novel Si micromachined moving-coil induction actuated mm-sized resonant scanner LCM Oliveira, PR Barbaroto, LOS Ferreira, I Doi Journal of Micromechanics and Microengineering 16 (1), 165, 2005 | 21 | 2005 |
| The surface texturing of monocrystalline silicon with NH4OH and ion implantation for applications in solar cells compatible with CMOS technology AR Silva, J Miyoshi, JA Diniz, I Doi, J Godoy Energy Procedia 44, 132-137, 2014 | 18 | 2014 |
| Titanium nitride as promising gate electrode for MOS technology LPB Lima, MA Moreira, JA Diniz, I Doi physica status solidi c 9 (6), 1427-1430, 2012 | 17 | 2012 |
| Germanium nanoparticles grown at different deposition times for memory device applications M Mederos, SNM Mestanza, R Lang, I Doi, JA Diniz Thin Solid Films 611, 39-45, 2016 | 16 | 2016 |
| Development of process for far infrared sensor fabrication RR Neli, I Doi, JA Diniz, JW Swart Sensors and Actuators A: Physical 132 (1), 400-406, 2006 | 16 | 2006 |
| Insulators obtained by electron cyclotron resonance plasmas on Si or GaAs JA Diniz, I Doi, JW Swart Materials characterization 50 (2-3), 135-147, 2003 | 16 | 2003 |
| Thermal stability of Ni (Pt) silicide films formed on poly-Si I Doi, RC Teixeira, RE Santos, JA Diniz, JW Swart, SG Santos Filho Microelectronic engineering 82 (3-4), 485-491, 2005 | 15 | 2005 |
| Modification of the refractive index and the dielectric constant of silicon dioxide by means of ion implantation JW Swart, JA Diniz, I Doi, MAB de Moraes Nuclear Instruments and Methods in Physics Research Section B: Beam …, 2000 | 15 | 2000 |
| Fabrication and characterization of Ge nanocrystalline growth by ion implantation in SiO2 matrix SNM Mestanza, I Doi, JW Swart, NC Frateschi Journal of materials science 42, 7757-7761, 2007 | 14 | 2007 |
| Characterization and modeling of antireflective coatings of SiO2, Si3N4, and SiOxNy deposited by electron cyclotron resonance enhanced plasma chemical vapor deposition SNM Mestanza, MP Obrador, E Rodriguez, C Biasotto, JA Diniz, JW Swart Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2006 | 13 | 2006 |
| Influence of Al/TiN/SiO2 structure on MOS capacitor, Schottky diode, and fin field effect transistors devices LPB Lima, JA Diniz, C Radtke, MVP dos Santos, J Godoy Fo Journal of Vacuum Science & Technology B 31 (5), 2013 | 12 | 2013 |
| Tantalum nitride as promising gate electrode for MOS technology L Lima, MD Moreira, F Cioldin, JA Diniz, I Doi ECS Transactions 31 (1), 319, 2010 | 11 | 2010 |
| Investigation of Ni silicides formation on (100) Si by X-ray diffraction (XRD) RE dos Santos, I Doi, JA Diniz, JW Swart, SG dos Santos Filho | 11 | 2008 |
