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Hanearl Jung
Hanearl Jung
Ph. D. Electrical & Electronic Engineering, Yonsei University
Verified email at yonsei.ac.kr
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Year
Layer-controlled, wafer-scale, and conformal synthesis of tungsten disulfide nanosheets using atomic layer deposition
JG Song, J Park, W Lee, T Choi, H Jung, CW Lee, SH Hwang, JM Myoung, ...
ACS nano 7 (12), 11333-11340, 2013
4042013
Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
JG Song, GH Ryu, SJ Lee, S Sim, CW Lee, T Choi, H Jung, Y Kim, Z Lee, ...
Nature communications 6 (1), 7817, 2015
2262015
Self-limiting layer synthesis of transition metal dichalcogenides
Y Kim, JG Song, YJ Park, GH Ryu, SJ Lee, JS Kim, PJ Jeon, CW Lee, ...
Scientific reports 6 (1), 18754, 2016
1002016
Synthesis of few-layered graphene nanoballs with copper cores using solid carbon source
S Lee, J Hong, JH Koo, H Lee, S Lee, T Choi, H Jung, B Koo, J Park, ...
ACS applied materials & interfaces 5 (7), 2432-2437, 2013
722013
Nucleation and Growth of the HfO2 Dielectric Layer for Graphene-Based Devices
IK Oh, J Tanskanen, H Jung, K Kim, MJ Lee, Z Lee, SK Lee, JH Ahn, ...
Chemistry of Materials 27 (17), 5868-5877, 2015
492015
n-ZnO: N/p-Si nanowire photodiode prepared by atomic layer deposition
H Kang, J Park, T Choi, H Jung, KH Lee, S Im, H Kim
Applied Physics Letters 100 (4), 2012
482012
Enhanced Light Stability of InGaZnO Thin-Film Transistors by Atomic-Layer-Deposited Y2O3 with Ozone
H Jung, WH Kim, BE Park, WJ Woo, IK Oh, SJ Lee, YC Kim, JM Myoung, ...
ACS applied materials & interfaces 10 (2), 2143-2150, 2018
432018
Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an …
H Jung, WH Kim, IK Oh, CW Lee, C Lansalot-Matras, SJ Lee, JM Myoung, ...
Journal of Materials Science 51, 5082-5091, 2016
392016
The electrical properties of low pressure chemical vapor deposition Ga doped ZnO thin films depending on chemical bonding configuration
H Jung, D Kim, H Kim
Applied surface science 297, 125-129, 2014
362014
Coupled self-assembled monolayer for enhancement of Cu diffusion barrier and adhesion properties
Y Chung, S Lee, C Mahata, J Seo, SM Lim, M Jeong, H Jung, YC Joo, ...
RSC Advances 4 (104), 60123-60130, 2014
252014
Very high frequency plasma reactant for atomic layer deposition
IK Oh, G Yoo, CM Yoon, TH Kim, GY Yeom, K Kim, Z Lee, H Jung, ...
Applied Surface Science 387, 109-117, 2016
192016
Optimization and device application potential of oxide–metal–oxide transparent electrode structure
YC Kim, SJ Lee, H Jung, BE Park, H Kim, W Lee, JM Myoung
RSC advances 5 (80), 65094-65099, 2015
192015
Fabrication of Transferable Al2O3 Nanosheet by Atomic Layer Deposition for Graphene FET
H Jung, J Park, IK Oh, T Choi, S Lee, J Hong, T Lee, SH Kim, H Kim
ACS applied materials & interfaces 6 (4), 2764-2769, 2014
182014
Effects of Ar Addition to O2 Plasma on Plasma-Enhanced Atomic Layer Deposition of Oxide Thin Films
H Jung, IK Oh, CM Yoon, BE Park, S Lee, O Kwon, WJ Lee, SH Kwon, ...
ACS applied materials & interfaces 10 (46), 40286-40293, 2018
162018
Surface treatment process applicable to next generation graphene-based electronics
KS Kim, HK Hong, H Jung, IK Oh, Z Lee, H Kim, GY Yeom, KN Kim
Carbon 104, 119-124, 2016
112016
Growth characteristics of graphene synthesized via chemical vapor deposition using carbon tetrabromide precursor
T Choi, H Jung, CW Lee, KY Mun, SH Kim, J Park, H Kim
Applied Surface Science 343, 128-132, 2015
92015
Atomic layer deposition of HfO2 on graphene through controlled ion beam treatment
KS Kim, IK Oh, H Jung, H Kim, GY Yeom, KN Kim
Applied Physics Letters 108 (21), 2016
82016
Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic …
H Jung, IK Oh, S Yeo, H Kim, SJ Lee, YC Kim, JM Myoung, SH Kim, ...
Journal of Vacuum Science & Technology A 35 (3), 2017
42017
Effects of TaN diffusion barrier on Cu-gate ZnO: N thin-film transistors
WJ Woo, T Nam, H Jung, IK Oh, JG Song, W Maeng, H Kim
IEEE Electron Device Letters 37 (5), 599-602, 2016
42016
Improved electrical properties in Cu gate TFT with oxide semiconductor by using TaN diffusion barrier
WJ Woo, T Nam, H Jung, IK Oh, H Kim
ITC-CSCC: International Technical Conference on Circuits Systems, Computers …, 2015
2015
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