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George Lippincott
George Lippincott
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Caching of lithography and etch simulation results
G Lippincott, N Cobb, R Todd
US Patent 6,973,633, 2005
692005
Selective promotion for resolution enhancement techniques
NB Cobb, LW Grodd, GP Lippincott, E Sahouria
US Patent 6,668,367, 2003
58*2003
Short edge management in rule based OPC
GP Lippincott, K Sakajiri, LW Grodd
US Patent 6,817,003, 2004
452004
OPC conflict identification and edge priority system
GP Lippincott
US Patent 7,240,305, 2007
372007
Short edge management in rule based OPC
GP Lippincott, K Sakajiri, LW Grodd
US Patent 7,181,721, 2007
352007
Short edge smoothing for enhanced scatter bar placement
GP Lippincott
US Patent 6,857,109, 2005
302005
OPC conflict identification and edge priority system
GP Lippincott
US Patent 7,865,863, 2011
292011
Short edge smoothing for enhanced scatter bar placement
GP Lippincott
US Patent 7,281,234, 2007
292007
Model-based OPC using the MEEF matrix II
J Lei, L Hong, G Lippincott, J Word
Optical Microlithography XXVII 9052, 170-178, 2014
162014
Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography
Y Ma, J Lei, JA Torres, L Hong, J Word, G Fenger, A Tritchkov, ...
Alternative Lithographic Technologies VII 9423, 23-33, 2015
142015
Pre-bias optical proximity correction
JAT Robles, AM Jost, MC Simmons, GP Lippincott
US Patent 8,185,847, 2012
132012
Pre-bias optical proximity correction
JAT Robles, AM Jost, MC Simmons, GP Lippincott
US Patent 7,739,650, 2010
122010
Generation and placement of sub-resolution assist features
GP Lippincott, L Friedrich
US Patent App. 12/821,065, 2010
112010
Retargeting based on process window simulation
CE Reid, GP Lippincott
US Patent 8,533,637, 2013
92013
Directed self-assembly graphoepitaxy template generation with immersion lithography
Y Ma, J Lei, J Andres Torres, L Hong, J Word, G Fenger, A Tritchkov, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (3), 031216-031216, 2015
72015
Can fast rule-based assist feature generation in random-logic contact layout provide sufficient process window?
A Omran, G Lippincott, J Schacht, J Lei, L Hong, L Friedrich, R Shen, ...
Optical Microlithography XXV 8326, 575-585, 2012
72012
Layout design defect repair using inverse lithography
G Lippincott, Y Granik, S Kobelkov
US Patent 8,788,982, 2014
62014
Layout decomposition based on partial intensity distribution
CE Reid, GP Lippincott, SM Komirenko
US Patent 8,352,891, 2013
62013
Site selective optical proximity correction
GP Lipincott, CE Reid
US Patent 8,191,017, 2012
62012
OPC conflict identification and edge priority system
GP Lippincott
US Patent 8,806,390, 2014
42014
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