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Jory Yarmoff
Jory Yarmoff
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Microscopic structure of the /Si interface
FJ Himpsel, FR McFeely, A Taleb-Ibrahimi, JA Yarmoff, G Hollinger
Physical review B 38 (9), 6084, 1988
21591988
Arsenic (III) and arsenic (V) reactions with zerovalent iron corrosion products
BA Manning, ML Hunt, C Amrhein, JA Yarmoff
Environmental science & technology 36 (24), 5455-5461, 2002
5222002
Valence electronic structure of
JA Yarmoff, DR Clarke, W Drube, UO Karlsson, A Taleb-Ibrahimi, ...
Physical Review B 36 (7), 3967, 1987
2771987
Electronic structure of the /Si(111) interface
D Rieger, FJ Himpsel, UO Karlsson, FR McFeely, JF Morar, JA Yarmoff
Physical Review B 34 (10), 7295, 1986
2181986
The chemisorption of chlorosilanes and chlorine on Si (111) 7× 7
LJ Whitman, SA Joyce, JA Yarmoff, FR McFeely, LJ Terminello
Surface science 232 (3), 297-306, 1990
1801990
Removal of contaminants from aqueous solution by reaction with iron surfaces
SR Qiu, HF Lai, MJ Roberson, ML Hunt, C Amrhein, LC Giancarlo, ...
Langmuir 16 (5), 2230-2236, 2000
1622000
Impact-collision ion-scattering spectroscopy of Cu(110) and Cu(110)-(2×1)-O using 5-keV
JA Yarmoff, DM Cyr, JH Huang, S Kim, RS Williams
Physical Review B 33 (6), 3856, 1986
1271986
Determination of Interface States for Ca/Si(111) from Near-Edge X-Ray-Absorption Measurements
FJ Himpsel, UO Karlsson, JF Morar, D Rieger, JA Yarmoff
Physical review letters 56 (14), 1497, 1986
1151986
Resonant neutralization of 7Li+ scattered from alkali/Al (100) as a probe of the local electrostatic potential
CB Weare, JA Yarmoff
Surface science 348 (3), 359-369, 1996
1131996
Fine structure of the Ca 2p x-ray-absorption edge for bulk compounds, surfaces, and interfaces
FJ Himpsel, UO Karlsson, AB McLean, LJ Terminello, FMF De Groot, ...
Physical Review B 43 (9), 6899, 1991
1021991
etching of Si(111): The geometric structure of the reaction layer
CW Lo, DK Shuh, V Chakarian, TD Durbin, PR Varekamp, JA Yarmoff
Physical Review B 47 (23), 15648, 1993
941993
Atomic layer epitaxy of silicon by dichlorosilane studied with core level spectroscopy
JA Yarmoff, DK Shuh, TD Durbin, CW Lo, DA Lapiano‐Smith, FR McFeely, ...
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 10 (4 …, 1992
881992
Fundamental studies of halogen reactions with III-V semiconductor surfaces
WC Simpson, JA Yarmoff
Annual review of physical chemistry 47 (1), 527-554, 1996
821996
Formation of a New Ordered Structure of Ca/Si(111) by Ultraviolet Irradiation
UO Karlsson, FJ Himpsel, JF Morar, FR McFeely, D Rieger, JA Yarmoff
Physical review letters 57 (10), 1247, 1986
791986
Interaction of O2 with the Fe0. 84Cr0. 16 (001) surface studied by photoelectron spectroscopy
JR Lince, SV Didziulis, DK Shuh, TD Durbin, JA Yarmoff
Surface Science 277 (1-2), 43-63, 1992
661992
Oxygen removal from Si via reaction with adsorbed Ge
JF Morar, BS Meyerson, UO Karlsson, FJ Himpsel, FR McFeely, D Rieger, ...
Applied physics letters 50 (8), 463-465, 1987
651987
Surface Termination of Cleaved Investigated by Low Energy Ion Scattering
X He, W Zhou, ZY Wang, YN Zhang, J Shi, RQ Wu, JA Yarmoff
Physical Review Letters 110 (15), 156101, 2013
632013
Passivation versus Etching: Adsorption of on InAs(001)
WK Wang, WC Simpson, JA Yarmoff
Physical review letters 81 (7), 1465, 1998
581998
Stimulated desorption of Cl+ and the chemisorption of Cl2 on Si (111)-7× 7 and Si (100)-2× 1
TD Durbin, WC Simpson, V Chakarian, DK Shuh, PR Varekamp, CW Lo, ...
Surface science 316 (3), 257-266, 1994
581994
Mechanism for chemical‐vapor deposition of tungsten on silicon from tungsten hexafluoride
JA Yarmoff, FR McFeely
Journal of applied physics 63 (11), 5213-5219, 1988
571988
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