| Microscopic structure of the /Si interface FJ Himpsel, FR McFeely, A Taleb-Ibrahimi, JA Yarmoff, G Hollinger Physical review B 38 (9), 6084, 1988 | 2159 | 1988 |
| Arsenic (III) and arsenic (V) reactions with zerovalent iron corrosion products BA Manning, ML Hunt, C Amrhein, JA Yarmoff Environmental science & technology 36 (24), 5455-5461, 2002 | 522 | 2002 |
| Valence electronic structure of JA Yarmoff, DR Clarke, W Drube, UO Karlsson, A Taleb-Ibrahimi, ... Physical Review B 36 (7), 3967, 1987 | 277 | 1987 |
| Electronic structure of the /Si(111) interface D Rieger, FJ Himpsel, UO Karlsson, FR McFeely, JF Morar, JA Yarmoff Physical Review B 34 (10), 7295, 1986 | 218 | 1986 |
| The chemisorption of chlorosilanes and chlorine on Si (111) 7× 7 LJ Whitman, SA Joyce, JA Yarmoff, FR McFeely, LJ Terminello Surface science 232 (3), 297-306, 1990 | 180 | 1990 |
| Removal of contaminants from aqueous solution by reaction with iron surfaces SR Qiu, HF Lai, MJ Roberson, ML Hunt, C Amrhein, LC Giancarlo, ... Langmuir 16 (5), 2230-2236, 2000 | 162 | 2000 |
| Impact-collision ion-scattering spectroscopy of Cu(110) and Cu(110)-(2×1)-O using 5-keV JA Yarmoff, DM Cyr, JH Huang, S Kim, RS Williams Physical Review B 33 (6), 3856, 1986 | 127 | 1986 |
| Determination of Interface States for Ca/Si(111) from Near-Edge X-Ray-Absorption Measurements FJ Himpsel, UO Karlsson, JF Morar, D Rieger, JA Yarmoff Physical review letters 56 (14), 1497, 1986 | 115 | 1986 |
| Resonant neutralization of 7Li+ scattered from alkali/Al (100) as a probe of the local electrostatic potential CB Weare, JA Yarmoff Surface science 348 (3), 359-369, 1996 | 113 | 1996 |
| Fine structure of the Ca 2p x-ray-absorption edge for bulk compounds, surfaces, and interfaces FJ Himpsel, UO Karlsson, AB McLean, LJ Terminello, FMF De Groot, ... Physical Review B 43 (9), 6899, 1991 | 102 | 1991 |
| etching of Si(111): The geometric structure of the reaction layer CW Lo, DK Shuh, V Chakarian, TD Durbin, PR Varekamp, JA Yarmoff Physical Review B 47 (23), 15648, 1993 | 94 | 1993 |
| Atomic layer epitaxy of silicon by dichlorosilane studied with core level spectroscopy JA Yarmoff, DK Shuh, TD Durbin, CW Lo, DA Lapiano‐Smith, FR McFeely, ... Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 10 (4 …, 1992 | 88 | 1992 |
| Fundamental studies of halogen reactions with III-V semiconductor surfaces WC Simpson, JA Yarmoff Annual review of physical chemistry 47 (1), 527-554, 1996 | 82 | 1996 |
| Formation of a New Ordered Structure of Ca/Si(111) by Ultraviolet Irradiation UO Karlsson, FJ Himpsel, JF Morar, FR McFeely, D Rieger, JA Yarmoff Physical review letters 57 (10), 1247, 1986 | 79 | 1986 |
| Interaction of O2 with the Fe0. 84Cr0. 16 (001) surface studied by photoelectron spectroscopy JR Lince, SV Didziulis, DK Shuh, TD Durbin, JA Yarmoff Surface Science 277 (1-2), 43-63, 1992 | 66 | 1992 |
| Oxygen removal from Si via reaction with adsorbed Ge JF Morar, BS Meyerson, UO Karlsson, FJ Himpsel, FR McFeely, D Rieger, ... Applied physics letters 50 (8), 463-465, 1987 | 65 | 1987 |
| Surface Termination of Cleaved Investigated by Low Energy Ion Scattering X He, W Zhou, ZY Wang, YN Zhang, J Shi, RQ Wu, JA Yarmoff Physical Review Letters 110 (15), 156101, 2013 | 63 | 2013 |
| Passivation versus Etching: Adsorption of on InAs(001) WK Wang, WC Simpson, JA Yarmoff Physical review letters 81 (7), 1465, 1998 | 58 | 1998 |
| Stimulated desorption of Cl+ and the chemisorption of Cl2 on Si (111)-7× 7 and Si (100)-2× 1 TD Durbin, WC Simpson, V Chakarian, DK Shuh, PR Varekamp, CW Lo, ... Surface science 316 (3), 257-266, 1994 | 58 | 1994 |
| Mechanism for chemical‐vapor deposition of tungsten on silicon from tungsten hexafluoride JA Yarmoff, FR McFeely Journal of applied physics 63 (11), 5213-5219, 1988 | 57 | 1988 |
