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John N. Randall
John N. Randall
Zyvex Labs
Verified email at zyvexlabs.com
Title
Cited by
Cited by
Year
Observation of discrete electronic states in a zero-dimensional semiconductor nanostructure
MA Reed, JN Randall, RJ Aggarwal, RJ Matyi, TM Moore, AE Wetsel
Physical review letters 60 (6), 535, 1988
14951988
Characteristics of micromachined switches at microwave frequencies
C Goldsmith, J Randall, S Eshelman, TH Lin, D Denniston, S Chen, ...
1996 IEEE MTT-S International Microwave Symposium Digest 2, 1141-1144, 1996
3481996
Grated landing area to eliminate sticking of micro-mechanical devices
DJ Weaver, JN Randall
US Patent 5,665,997, 1997
3251997
A technique for the determination of stress in thin films
EI Bromley, JN Randall, DC Flanders, RW Mountain
Journal of Vacuum Science & Technology B: Microelectronics Processing and …, 1983
2641983
Realization of a three-terminal resonant tunneling device: The bipolar quantum resonant tunneling transistor
MA Reed, WR Frensley, RJ Matyi, JN Randall, AC Seabaugh
Applied physics letters 54 (11), 1034-1036, 1989
1691989
Recessed etch RF micro-electro-mechanical switch
JN Randall, MY Kao
US Patent 6,100,477, 2000
1462000
Self‐developing resist with submicrometer resolution and processing stability
MW Geis, JN Randall, TF Deutsch, PD DeGraff, KE Krohn, LA Stern
Applied Physics Letters 43 (1), 74-76, 1983
971983
Optical proximity correction
JN Randall, TJ Aton, SR Palmer
US Patent 6,634,018, 2003
902003
Nanoelectronics: Fanciful physics or real devices?
JN Randall, MA Reed, GA Frazier
Journal of Vacuum Science & Technology B: Microelectronics Processing and …, 1989
841989
Controlling the atomic layer deposition of titanium dioxide on silicon: Dependence on surface termination
S McDonnell, RC Longo, O Seitz, JB Ballard, G Mordi, D Dick, JHG Owen, ...
The Journal of Physical Chemistry C 117 (39), 20250-20259, 2013
752013
Atomic precision lithography on Si
JN Randall, JW Lyding, S Schmucker, JR Von Ehr, J Ballard, R Saini, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2009
752009
Lateral resonant tunneling device having gate electrode aligned with tunneling barriers
D Jovanovic, JN Randall
US Patent 5,504,347, 1996
681996
Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography
SW Schmucker, N Kumar, JR Abelson, SR Daly, GS Girolami, MR Bischof, ...
Nature communications 3 (1), 935, 2012
622012
Pseudomorphic bipolar quantum resonant-tunneling transistor
AC Seabaugh, WR Frensley, JN Randall, MA Reed, DL Farrington, ...
IEEE Transactions on Electron Devices 36 (10), 2328-2334, 1989
601989
Selectivity of metal oxide atomic layer deposition on hydrogen terminated and oxidized Si (001)-(2× 1) surface
RC Longo, S McDonnell, D Dick, RM Wallace, YJ Chabal, JHG Owen, ...
Journal of Vacuum Science & Technology B 32 (3), 2014
562014
Dual-mask model-based proximity correction for high-performance 0.10-um CMOS process
SR Palmer, ME Mason, JN Randall, T Aton, K Kim, AV Tritchkov, J Burdorf, ...
20th Annual BACUS Symposium on Photomask Technology 4186, 921-932, 2001
562001
Variable-threshold resist models for lithography simulation
J Randall, KG Ronse, T Marschner, AM Goethals, M Ercken
Optical Microlithography XII 3679, 176-182, 1999
551999
Co-integrated resonant tunneling and heterojunction bipolar transistor full adder
AC Seabaugh, AH Taddiken, EA Beam, JN Randall, YC Kao, B Newell
Proceedings of IEEE International Electron Devices Meeting, 419-422, 1993
531993
High resolution ion beam lithography at large gaps using stencil masks
JN Randall, DC Flanders, NP Economou, JP Donnelly, EI Bromley
Applied Physics Letters 42 (5), 457-459, 1983
491983
Nitrocellulose as a self‐developing resist with submicrometer resolution and processing stability
MW Geis, JN Randall, TF Deutsch, NN Efremow, JP Donnelly, ...
Journal of Vacuum Science & Technology B: Microelectronics Processing and …, 1983
461983
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Articles 1–20