Taewook Nam
Taewook Nam
Assistant professor at Electronics and Information Engineering, Soonchunhyang University
Verified email at - Homepage
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MoS2 Nanosheet Phototransistors with Thickness-Modulated Optical Energy Gap
HS Lee, SW Min, YG Chang, MK Park, T Nam, H Kim, JH Kim, S Ryu, S Im
Nano letters 12 (7), 3695-3700, 2012
Graphene as an atomically thin barrier to Cu diffusion into Si
J Hong, S Lee, S Lee, H Han, C Mahata, HW Yeon, B Koo, SI Kim, T Nam, ...
Nanoscale 6 (13), 7503-7511, 2014
Nanosheet thickness-modulated MoS2 dielectric property evidenced by field-effect transistor performance
SW Min, HS Lee, HJ Choi, MK Park, T Nam, H Kim, S Ryu, S Im
Nanoscale, 2013
Low-temperature Atomic Layer Deposition of TiO2, Al2O3, and ZnO Thin films
T Nam, JM Kim, MK Kim, WH Kim, H Kim
Journal of the Korean Physical Society 59 (2), 452~457, 2011
Direct imprinting of MoS 2 flakes on a patterned gate for nanosheet transistors
K Choi, YT Lee, SW Min, HS Lee, T Nam, H Kim, S Im
Journal of Materials Chemistry C 1 (47), 7803-7807, 2013
A composite layer of atomic-layer-deposited Al2O3 and graphene for flexible moisture barrier
T Nam, YJ Park, H Lee, IK Oh, JH Ahn, SM Cho, H Kim
Carbon 116, 553-561, 2017
Growth characteristics and properties of Ga-doped ZnO (GZO) thin films grown by thermal and plasma-enhanced atomic layer deposition
T Nam, CW Lee, HJ Kim, H Kim
Applied surface science 295, 260-265, 2014
Atomic layer deposition ZnO: N flexible thin film transistors and the effects of bending on device properties
JM Kim, T Nam, SJ Lim, YG Seol, NE Lee, D Kim, H Kim
Applied Physics Letters 98 (14), 2011
Low-temperature, high-growth-rate ALD of SiO2 using aminodisilane precursor
T Nam, H Lee, T Choi, S Seo, CM Yoon, Y Choi, H Jeong, HK Lingam, ...
Applied Surface Science 485, 381-390, 2019
Atomic layer deposition of a uniform thin film on two-dimensional transition metal dichalcogenides
T Nam, S Seo, H Kim
Journal of Vacuum Science & Technology A 38 (3), 2020
Molecular oxidation of surface–CH3 during atomic layer deposition of Al2O3 with H2O, H2O2, and O3: A theoretical study
S Seo, T Nam, H Kim, B Shong
Applied Surface Science 457, 376-380, 2018
Comparative study on atomic layer deposition of HfO 2 via substitution of ligand structure with cyclopentadiene
S Park, BE Park, H Yoon, S Lee, T Nam, T Cheon, SH Kim, H Cheon, S Im, ...
Journal of Materials Chemistry C 8 (4), 1344-1352, 2020
Growth characteristics and properties of indium oxide and indium-doped zinc oxide by atomic layer deposition
D Kim, T Nam, J Park, J Gatineau, H Kim
Thin Solid Films 587, 83-87, 2015
The effects of ultraviolet exposure on the device characteristics of atomic layer deposited-ZnO: N thin film transistors
JM Kim, SJ Lim, T Nam, D Kim, H Kim
Journal of the Electrochemical Society 158 (5), J150, 2011
Surface-Localized Sealing of Porous Ultralow-k Dielectric Films with Ultrathin (<2 nm) Polymer Coating
SJ Yoon, K Pak, T Nam, A Yoon, H Kim, SG Im, BJ Cho
ACS nano 11 (8), 7841-7847, 2017
Hydrogen barrier performance of sputtered La2O3 films for InGaZnO thin-film transistor
Y Lee, CH Lee, T Nam, S Lee, IK Oh, JY Yang, DW Choi, C Yoo, H Kim, ...
Journal of Materials Science 54, 11145-11156, 2019
Hydrogen Barriers Based on Chemical Trapping Using Chemically Modulated Al2O3 Grown by Atomic Layer Deposition for InGaZnO Thin-Film Transistors
Y Lee, T Nam, S Seo, H Yoon, IK Oh, CH Lee, H Yoo, HJ Kim, W Choi, ...
ACS Applied Materials & Interfaces 13 (17), 20349-20360, 2021
Atomic layer deposition for nonconventional nanomaterials and their applications
T Nam, H Kim
Journal of Materials Research 35 (7), 656-680, 2020
Moisture barrier properties of low-temperature atomic layer deposited Al2O3 using various oxidants
T Nam, H Lee, S Seo, SM Cho, B Shong, H Kim
Ceramics International 45 (15), 19105-19112, 2019
2D MoS2 Charge Injection Memory Transistors Utilizing Hetero‐Stack SiO2/HfO2 Dielectrics and Oxide Interface Traps
LJ Widiapradja, T Nam, Y Jeong, HJ Jin, Y Lee, K Kim, S Lee, H Kim, ...
Advanced Electronic Materials, 2100074, 2021
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