| Dual roles of a xanthate as a radical source and chain transfer agent in the photoinitiated RAFT polymerization of vinyl acetate MY Khan, MS Cho, YJ Kwark Macromolecules 47 (6), 1929-1934, 2014 | 75 | 2014 |
| Superamphiphilic janus fabric HS Lim, SH Park, SH Koo, YJ Kwark, EL Thomas, Y Jeong, JH Cho Langmuir 26 (24), 19159-19162, 2010 | 70 | 2010 |
| Doxorubicin-Loaded Alginate-g-Poly(N-isopropylacrylamide) Micelles for Cancer Imaging and Therapy DG Ahn, J Lee, SY Park, YJ Kwark, KY Lee ACS Applied Materials & Interfaces 6 (24), 22069-22077, 2014 | 67 | 2014 |
| Fluorinated polymers: liquid crystalline properties and applications in lithography S Krishnan, YJ Kwark, CK Ober The Chemical Record 4 (5), 315-330, 2004 | 61 | 2004 |
| Photoinitiated RAFT polymerization of vinyl acetate M Ham, J HoYouk, YK Kwon, YJ Kwark Journal of Polymer Science Part A: Polymer Chemistry 50 (12), 2389-2397, 2012 | 55 | 2012 |
| Absorbance measurement of polymers at extreme ultraviolet wavelength: correlation between experimental and theoretical calculations YJ Kwark, JP Bravo-Vasquez, M Chandhok, H Cao, H Deng, E Gullikson, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2006 | 42 | 2006 |
| New strategies for high resolution photoresists CK Ober, K Douki, VR Vohra, YJ Kwark, XQ Liu, W Conley, D Miller, ... Journal of Photopolymer Science and Technology 15 (4), 603-611, 2002 | 38 | 2002 |
| Materials for future lithography SW Chang, D Yang, J Dai, N Felix, D Bratton, K Tsuchiya, YJ Kwark, ... Advances in Resist Technology and Processing XXII 5753, 1-9, 2005 | 37 | 2005 |
| Materials for future lithography SW Chang, D Yang, J Dai, N Felix, D Bratton, K Tsuchiya, YJ Kwark, ... Advances in Resist Technology and Processing XXII 5753, 1-9, 2005 | 37 | 2005 |
| Kinetics of emulsion copolymerization of vinyl acetate and vinyl pivalate YJ Kwark, WS Lyoo, WS Ha Polymer journal 28 (10), 851-859, 1996 | 34 | 1996 |
| Interpenetrating polymer network dielectrics for high-performance organic field-effect transistors HS Lee, K Park, JD Kim, T Han, KH Ryu, HS Lim, DR Lee, YJ Kwark, ... Journal of Materials Chemistry 21 (19), 6968-6974, 2011 | 32 | 2011 |
| Synthesis of high-molecular-weight atactic poly (vinyl alcohol) III: Synthesis of high-molecular-weight atactic poly (vinyl alcohol) by the low temperature-redox emulsion … WS Lyoo, YJ Kwark, WS HA Hanguk Somyu Konghakhoechi 33 (4), 321-329, 1996 | 30 | 1996 |
| Simultaneous control over the molecular weight and tacticity of poly (vinyl acetate) using a low-temperature photoinitiated RAFT process in fluoroalcohols SH Shim, M Ham, J Huh, YK Kwon, YJ Kwark Polymer Chemistry 4 (21), 5449-5455, 2013 | 29 | 2013 |
| Robust multifunctional superhydrophobic organic–inorganic hybrid macroporous coatings and films SH Koo, SG Lee, H Bong, YJ Kwark, K Cho, HS Lim, JH Cho Polymer 55 (11), 2661-2666, 2014 | 26 | 2014 |
| Determination of the kinetic parameters of atom transfer radical polymerizations YJ Kwark, BM Novak Macromolecules 37 (25), 9395-9401, 2004 | 25 | 2004 |
| Highly transparent resist platforms for 157-nm microlithography: an update VR Vohra, K Douki, YJ Kwark, XQ Liu, CK Ober, YC Bae, W Conley, ... Advances in Resist Technology and Processing XIX 4690, 84-93, 2002 | 25 | 2002 |
| Highly transparent resist platforms for 157-nm microlithography: an update VR Vohra, K Douki, YJ Kwark, XQ Liu, CK Ober, YC Bae, W Conley, ... Advances in Resist Technology and Processing XIX 4690, 84-93, 2002 | 25 | 2002 |
| Solvent-free processable and photo-patternable hybrid gate dielectric for flexible top-gate organic field-effect transistors JS Kwon, HW Park, DH Kim, YJ Kwark ACS Applied Materials & Interfaces 9 (6), 5366-5374, 2017 | 24 | 2017 |
| Novel silicon-containing polymers as photoresist materials for EUV lithography YJ Kwark, JP Bravo-Vasquez, CK Ober, HB Cao, H Deng, RP Meagley Advances in Resist Technology and Processing XX 5039, 1204-1211, 2003 | 20 | 2003 |
| Novel silicon-containing polymers as photoresist materials for EUV lithography YJ Kwark, JP Bravo-Vasquez, CK Ober, HB Cao, H Deng, RP Meagley Advances in Resist Technology and Processing XX 5039, 1204-1211, 2003 | 20 | 2003 |
