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Young-Je Kwark
Young-Je Kwark
숭실대학교 신소재공학과 교수
ssu.ac.kr의 이메일 확인됨
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Dual roles of a xanthate as a radical source and chain transfer agent in the photoinitiated RAFT polymerization of vinyl acetate
MY Khan, MS Cho, YJ Kwark
Macromolecules 47 (6), 1929-1934, 2014
752014
Superamphiphilic janus fabric
HS Lim, SH Park, SH Koo, YJ Kwark, EL Thomas, Y Jeong, JH Cho
Langmuir 26 (24), 19159-19162, 2010
702010
Doxorubicin-Loaded Alginate-g-Poly(N-isopropylacrylamide) Micelles for Cancer Imaging and Therapy
DG Ahn, J Lee, SY Park, YJ Kwark, KY Lee
ACS Applied Materials & Interfaces 6 (24), 22069-22077, 2014
672014
Fluorinated polymers: liquid crystalline properties and applications in lithography
S Krishnan, YJ Kwark, CK Ober
The Chemical Record 4 (5), 315-330, 2004
612004
Photoinitiated RAFT polymerization of vinyl acetate
M Ham, J HoYouk, YK Kwon, YJ Kwark
Journal of Polymer Science Part A: Polymer Chemistry 50 (12), 2389-2397, 2012
552012
Absorbance measurement of polymers at extreme ultraviolet wavelength: correlation between experimental and theoretical calculations
YJ Kwark, JP Bravo-Vasquez, M Chandhok, H Cao, H Deng, E Gullikson, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2006
422006
New strategies for high resolution photoresists
CK Ober, K Douki, VR Vohra, YJ Kwark, XQ Liu, W Conley, D Miller, ...
Journal of Photopolymer Science and Technology 15 (4), 603-611, 2002
382002
Materials for future lithography
SW Chang, D Yang, J Dai, N Felix, D Bratton, K Tsuchiya, YJ Kwark, ...
Advances in Resist Technology and Processing XXII 5753, 1-9, 2005
372005
Materials for future lithography
SW Chang, D Yang, J Dai, N Felix, D Bratton, K Tsuchiya, YJ Kwark, ...
Advances in Resist Technology and Processing XXII 5753, 1-9, 2005
372005
Kinetics of emulsion copolymerization of vinyl acetate and vinyl pivalate
YJ Kwark, WS Lyoo, WS Ha
Polymer journal 28 (10), 851-859, 1996
341996
Interpenetrating polymer network dielectrics for high-performance organic field-effect transistors
HS Lee, K Park, JD Kim, T Han, KH Ryu, HS Lim, DR Lee, YJ Kwark, ...
Journal of Materials Chemistry 21 (19), 6968-6974, 2011
322011
Synthesis of high-molecular-weight atactic poly (vinyl alcohol) III: Synthesis of high-molecular-weight atactic poly (vinyl alcohol) by the low temperature-redox emulsion …
WS Lyoo, YJ Kwark, WS HA
Hanguk Somyu Konghakhoechi 33 (4), 321-329, 1996
301996
Simultaneous control over the molecular weight and tacticity of poly (vinyl acetate) using a low-temperature photoinitiated RAFT process in fluoroalcohols
SH Shim, M Ham, J Huh, YK Kwon, YJ Kwark
Polymer Chemistry 4 (21), 5449-5455, 2013
292013
Robust multifunctional superhydrophobic organic–inorganic hybrid macroporous coatings and films
SH Koo, SG Lee, H Bong, YJ Kwark, K Cho, HS Lim, JH Cho
Polymer 55 (11), 2661-2666, 2014
262014
Determination of the kinetic parameters of atom transfer radical polymerizations
YJ Kwark, BM Novak
Macromolecules 37 (25), 9395-9401, 2004
252004
Highly transparent resist platforms for 157-nm microlithography: an update
VR Vohra, K Douki, YJ Kwark, XQ Liu, CK Ober, YC Bae, W Conley, ...
Advances in Resist Technology and Processing XIX 4690, 84-93, 2002
252002
Highly transparent resist platforms for 157-nm microlithography: an update
VR Vohra, K Douki, YJ Kwark, XQ Liu, CK Ober, YC Bae, W Conley, ...
Advances in Resist Technology and Processing XIX 4690, 84-93, 2002
252002
Solvent-free processable and photo-patternable hybrid gate dielectric for flexible top-gate organic field-effect transistors
JS Kwon, HW Park, DH Kim, YJ Kwark
ACS Applied Materials & Interfaces 9 (6), 5366-5374, 2017
242017
Novel silicon-containing polymers as photoresist materials for EUV lithography
YJ Kwark, JP Bravo-Vasquez, CK Ober, HB Cao, H Deng, RP Meagley
Advances in Resist Technology and Processing XX 5039, 1204-1211, 2003
202003
Novel silicon-containing polymers as photoresist materials for EUV lithography
YJ Kwark, JP Bravo-Vasquez, CK Ober, HB Cao, H Deng, RP Meagley
Advances in Resist Technology and Processing XX 5039, 1204-1211, 2003
202003
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