| High performance and highly uniform gate-all-around silicon nanowire MOSFETs with wire size dependent scaling S Bangsaruntip, GM Cohen, A Majumdar, Y Zhang, SU Engelmann, ... 2009 IEEE International Electron Devices Meeting (IEDM), 1-4, 2009 | 590 | 2009 |
| Challenges and solutions of FinFET integration in an SRAM cell and a logic circuit for 22 nm node and beyond H Kawasaki, VS Basker, T Yamashita, CH Lin, Y Zhu, J Faltermeier, ... 2009 IEEE international electron devices meeting (IEDM), 1-4, 2009 | 186 | 2009 |
| Mronline: Mapreduce online performance tuning M Li, L Zeng, S Meng, J Tan, L Zhang, AR Butt, N Fuller Proceedings of the 23rd international symposium on High-performance parallel …, 2014 | 180 | 2014 |
| Characterization of transformer coupled oxygen plasmas by trace rare gases-optical emission spectroscopy and Langmuir probe analysis NCM Fuller, MV Malyshev, VM Donnelly, IP Herman Plasma Sources Science and Technology 9 (2), 116, 2000 | 127 | 2000 |
| FinFET performance advantage at 22nm: An AC perspective M Guillorn, J Chang, A Bryant, N Fuller, O Dokumaci, X Wang, J Newbury, ... 2008 Symposium on VLSI Technology, 12-13, 2008 | 122 | 2008 |
| Diagnostics of inductively coupled chlorine plasmas: Measurement of Cl2 and Cl number densities MV Malyshev, VM Donnelly Journal of Applied Physics 88 (11), 6207-6215, 2000 | 114 | 2000 |
| Effect of plasma interactions with low-κ films as a function of porosity, plasma chemistry, and temperature MA Worsley, SF Bent, SM Gates, N Fuller, W Volksen, M Steen, T Dalton Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2005 | 106 | 2005 |
| Interconnect structures with fully aligned vias DC Edelstein, NC Fuller, EE Huang, SV Nitta, DL Rath US Patent 9,324,650, 2016 | 97 | 2016 |
| Optical actinometry of Cl, and densities in inductively coupled plasmas NCM Fuller, IP Herman, VM Donnelly Journal of Applied Physics 90 (7), 3182-3191, 2001 | 92 | 2001 |
| Demonstration of highly scaled FinFET SRAM cells with high-κ/metal gate and investigation of characteristic variability for the 32 nm node and beyond H Kawasaki, M Khater, M Guillorn, N Fuller, J Chang, S Kanakasabapathy, ... 2008 IEEE International Electron Devices Meeting, 1-4, 2008 | 77 | 2008 |
| Systems and methods for building and implementing ontology-based information resources JF Argüello, Y Drissi, NCM Fuller, IM Nnebe, DM Sow US Patent 7,739,218, 2010 | 68 | 2010 |
| Electron temperatures of inductively coupled plasmas NCM Fuller, VM Donnelly, IP Herman Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 20 (1 …, 2002 | 64 | 2002 |
| Characterization of neutral species densities in dual frequency capacitively coupled photoresist ash plasmas by optical emission actinometry MA Worsley, SF Bent, NCM Fuller, T Dalton Journal of applied physics 100 (8), 2006 | 60 | 2006 |
| Sub-lithographic dimensioned air gap formation and related structure DC Edelstein, NCM Fuller, DV Horak, EE Huang, W Li, AD Lisi, SV Nitta, ... US Patent 7,943,480, 2011 | 50 | 2011 |
| Optical plasma emission spectroscopy of etching plasmas used in Si-based semiconductor processing VM Donnelly, MV Malyshev, M Schabel, A Kornblit, W Tai, IP Herman, ... Plasma Sources Science and Technology 11 (3A), A26, 2002 | 45 | 2002 |
| Effect of radical species density and ion bombardment during ashing of extreme ultralow-κ interlevel dielectric materials MA Worsley, SF Bent, NCM Fuller, TL Tai, J Doyle, M Rothwell, T Dalton Journal of applied physics 101 (1), 2007 | 43 | 2007 |
| Sub-30 nm pitch line-space patterning of semiconductor and dielectric materials using directed self-assembly HY Tsai, H Miyazoe, S Engelmann, B To, E Sikorski, J Bucchignano, ... Journal of Vacuum Science & Technology B 30 (6), 2012 | 42 | 2012 |
| Laser-induced fluorescence and Langmuir probe determination of and absolute densities in transformer-coupled chlorine plasmas MV Malyshev, NCM Fuller, KHA Bogart, VM Donnelly, IP Herman Applied physics letters 74 (12), 1666-1668, 1999 | 42 | 1999 |
| The effects of vacuum ultraviolet radiation on low-k dielectric films H Sinha, H Ren, MT Nichols, JL Lauer, M Tomoyasu, NM Russell, G Jiang, ... Journal of Applied Physics 112 (11), 2012 | 40 | 2012 |
| Diagnostics of inductively coupled chlorine plasmas: Measurement of and densities MV Malyshev, NCM Fuller, KHA Bogart, VM Donnelly, IP Herman Journal of Applied Physics 88 (5), 2246-2251, 2000 | 40 | 2000 |
