NCM Fuller
NCM Fuller
IBM Research, Bell Labs and Columbia University
us.ibm.com의 이메일 확인됨
제목
인용
인용
연도
High performance and highly uniform gate-all-around silicon nanowire MOSFETs with wire size dependent scaling
S Bangsaruntip, GM Cohen, A Majumdar, Y Zhang, SU Engelmann, ...
2009 IEEE International Electron Devices Meeting (IEDM), 1-4, 2009
4482009
Challenges and solutions of FinFET integration in an SRAM cell and a logic circuit for 22 nm node and beyond
H Kawasaki, VS Basker, T Yamashita, CH Lin, Y Zhu, J Faltermeier, ...
2009 IEEE International Electron Devices Meeting (IEDM), 1-4, 2009
1732009
Mronline: Mapreduce online performance tuning
M Li, L Zeng, S Meng, J Tan, L Zhang, AR Butt, N Fuller
Proceedings of the 23rd international symposium on High-performance parallel …, 2014
1532014
Characterization of transformer coupled oxygen plasmas by trace rare gases-optical emission spectroscopy and Langmuir probe analysis
NCM Fuller, MV Malyshev, VM Donnelly, IP Herman
Plasma Sources Science and Technology 9 (2), 116, 2000
1122000
FinFET performance advantage at 22nm: An AC perspective
M Guillorn, J Chang, A Bryant, N Fuller, O Dokumaci, X Wang, J Newbury, ...
2008 Symposium on VLSI Technology, 12-13, 2008
1052008
Effect of plasma interactions with low- films as a function of porosity, plasma chemistry, and temperature
MA Worsley, SF Bent, SM Gates, NCM Fuller, W Volksen, M Steen, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2005
1052005
Diagnostics of inductively coupled chlorine plasmas: Measurement of and Cl number densities
MV Malyshev, VM Donnelly
Journal of Applied Physics 88 (11), 6207-6215, 2000
1012000
Optical actinometry of Cl, and densities in inductively coupled plasmas
NCM Fuller, IP Herman, VM Donnelly
Journal of Applied Physics 90 (7), 3182-3191, 2001
812001
Demonstration of highly scaled FinFET SRAM cells with high-κ/metal gate and investigation of characteristic variability for the 32 nm node and beyond
H Kawasaki, M Khater, M Guillorn, N Fuller, J Chang, S Kanakasabapathy, ...
2008 IEEE International Electron Devices Meeting, 1-4, 2008
752008
Systems and methods for building and implementing ontology-based information resources
JF Argüello, Y Drissi, NCM Fuller, IM Nnebe, DM Sow
US Patent 7,739,218, 2010
632010
Electron temperatures of inductively coupled plasmas
NCM Fuller, VM Donnelly, IP Herman
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 20 (1 …, 2002
632002
Interconnect structures with fully aligned vias
DC Edelstein, NC Fuller, EE Huang, SV Nitta, DL Rath
US Patent 9,324,650, 2016
612016
Characterization of neutral species densities in dual frequency capacitively coupled photoresist ash plasmas by optical emission actinometry
MA Worsley, SF Bent, NCM Fuller, T Dalton
Journal of applied physics 100 (8), 083301, 2006
532006
Sub-lithographic dimensioned air gap formation and related structure
DC Edelstein, NCM Fuller, DV Horak, EE Huang, W Li, AD Lisi, SV Nitta, ...
US Patent 7,943,480, 2011
432011
Effect of radical species density and ion bombardment during ashing of extreme ultralow- interlevel dielectric materials
MA Worsley, SF Bent, NCM Fuller, TL Tai, J Doyle, M Rothwell, T Dalton
Journal of applied physics 101 (1), 013305, 2007
422007
Laser-induced fluorescence and Langmuir probe determination of and absolute densities in transformer-coupled chlorine plasmas
MV Malyshev, NCM Fuller, KHA Bogart, VM Donnelly, IP Herman
Applied physics letters 74 (12), 1666-1668, 1999
411999
Diagnostics of inductively coupled chlorine plasmas: Measurement of and densities
MV Malyshev, NCM Fuller, KHA Bogart, VM Donnelly, IP Herman
Journal of Applied Physics 88 (5), 2246-2251, 2000
382000
Optical plasma emission spectroscopy of etching plasmas used in Si-based semiconductor processing
VM Donnelly, MV Malyshev, M Schabel, A Kornblit, W Tai, IP Herman, ...
Plasma Sources Science and Technology 11 (3A), A26, 2002
372002
The effects of vacuum ultraviolet radiation on low-k dielectric films
H Sinha, H Ren, MT Nichols, JL Lauer, M Tomoyasu, NM Russell, G Jiang, ...
Journal of Applied Physics 112 (11), 111101, 2012
362012
Sub-30 nm pitch line-space patterning of semiconductor and dielectric materials using directed self-assembly
HY Tsai, H Miyazoe, S Engelmann, B To, E Sikorski, J Bucchignano, ...
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2012
352012
현재 시스템이 작동되지 않습니다. 나중에 다시 시도해 주세요.
학술자료 1–20