Hyungjun Kim
Hyungjun Kim
School of Electrical abd Electronic Engineering, Yonsei University
Verified email at yonsei.ac.kr
TitleCited byYear
MoS2 nanosheet phototransistors with thickness-modulated optical energy gap
HS Lee, SW Min, YG Chang, MK Park, T Nam, H Kim, JH Kim, S Ryu, S Im
Nano letters 12 (7), 3695-3700, 2012
8612012
Atomic layer deposition of metal and nitride thin films: Current research efforts and applications for semiconductor device processing
H Kim
Journal of Vacuum Science & Technology B 21 (6), 2231-2261, 2003
5942003
Applications of atomic layer deposition to nanofabrication and emerging nanodevices
H Kim, HBR Lee, WJ Maeng
Thin Solid Films 517 (8), 2563-2580, 2009
4742009
High performance thin film transistor with low temperature atomic layer deposition nitrogen-doped ZnO
SJ Lim, S Kwon, H Kim, JS Park
Applied Physics Letters 91 (18), 183517, 2007
1792007
Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
JG Song, J Park, W Lee, T Choi, H Jung, CW Lee, SH Hwang, JM Myoung, ...
ACS nano 7 (12), 11333-11340, 2013
1782013
ZnO thin films prepared by atomic layer deposition and rf sputtering as an active layer for thin film transistor
SJ Lim, S Kwon, H Kim
Thin Solid Films 516 (7), 1523-1528, 2008
1612008
NiO resistive random access memory nanocapacitor array on graphene
JY Son, YH Shin, H Kim, HM Jang
ACS nano 4 (5), 2655-2658, 2010
1462010
Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
H Kim, C Cabral Jr, C Lavoie, SM Rossnagel
Journal of Vacuum Science & Technology B 20 (4), 1321-1326, 2002
1442002
Fabrication of rough Al doped ZnO films deposited by low pressure chemical vapor deposition for high efficiency thin film solar cells
D Kim, I Yun, H Kim
Current Applied Physics 10 (3), S459-S462, 2010
1252010
Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
H Kim, C Detavenier, O Van der Straten, SM Rossnagel, AJ Kellock, ...
Journal of applied physics 98 (1), 014308, 2005
1242005
Synthesis of wafer-scale uniform molybdenum disulfide films with control over the layer number using a gas phase sulfur precursor
Y Lee, J Lee, H Bark, IK Oh, GH Ryu, Z Lee, H Kim, JH Cho, JH Ahn, ...
Nanoscale 6 (5), 2821-2826, 2014
1222014
High-capacity, self-assembled metal-oxide-semiconductor decoupling capacitors
CT Black, KW Guarini, Y Zhang, H Kim, J Benedict, E Sikorski, IV Babich, ...
Electron Device Letters, IEEE 25 (9), 622-624, 2004
1212004
Photocatalytic properties of nano-structured TiO< sub> 2</sub> plasma sprayed coating
C Lee, H Choi, C Lee, H Kim
Surface and Coatings Technology 173 (2), 192-200, 2003
1192003
Exciton dynamics in atomically thin MoS 2: interexcitonic interaction and broadening kinetics
S Sim, J Park, JG Song, C In, YS Lee, H Kim, H Choi
Physical Review B 88 (7), 075434, 2013
1092013
Ru nanostructure fabrication using an anodic aluminum oxide nanotemplate and highly conformal Ru atomic layer deposition
WH Kim, SJ Park, JY Son, H Kim
Nanotechnology 19 (4), 045302, 2008
1082008
Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
H Kim, AJ Kellock, SM Rossnagel
Journal of applied physics 92 (12), 7080-7085, 2002
1082002
Thermal and plasma-enhanced ALD of Ta and Ti oxide thin films from alkylamide precursors
WJ Maeng, H Kim
Electrochemical and Solid-State Letters 9 (6), G191-G194, 2006
962006
The application of atomic layer deposition for metallization of 65 nm and beyond
H Kim
Surface and Coatings Technology 200 (10), 3104-3111, 2006
912006
High-quality cobalt thin films by plasma-enhanced atomic layer deposition
H Kim
Electrochemical and solid-state letters 9 (11), G323-G325, 2006
862006
Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
JG Song, GH Ryu, SJ Lee, S Sim, CW Lee, T Choi, H Jung, Y Kim, Z Lee, ...
Nature communications 6, 2015
832015
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Articles 1–20