Jiyoung Kim
Jiyoung Kim
Professor of Materials Science and Engineering, University of Texas at Dallas
Verified email at utdallas.edu - Homepage
Title
Cited by
Cited by
Year
GaAs interfacial self-cleaning by atomic layer deposition
CL Hinkle, AM Sonnet, EM Vogel, S McDonnell, GJ Hughes, M Milojevic, ...
Applied Physics Letters 92 (7), 071901, 2008
4522008
Conformal dielectric layer deposited by atomic layer deposition for graphene-based nanoelectronics
B Lee, SY Park, HC Kim, KJ Cho, EM Vogel, MJ Kim, RM Wallace, J Kim
Applied Physics Letters 92 (20), 203102, 2008
3552008
Template-directed synthesis of oxide nanotubes: fabrication, characterization, and applications
C Bae, H Yoo, S Kim, K Lee, J Kim, MM Sung, H Shin
Chemistry of Materials 20 (3), 756-767, 2008
3552008
Formation of TiO2 and ZrO2 Nanotubes Using Atomic Layer Deposition with Ultraprecise Control of the Wall Thickness
H Shin, DK Jeong, J Lee, MM Sung, J Kim
Advanced Materials 16 (14), 1197-1200, 2004
3252004
Metal Contacts on Physical Vapor Deposited Monolayer MoS2
C Gong, C Huang, J Miller, L Cheng, Y Hao, D Cobden, J Kim, RS Ruoff, ...
ACS nano 7 (12), 11350-11357, 2013
2592013
Covalent Nitrogen Doping and Compressive Strain in MoS2 by Remote N2 Plasma Exposure
A Azcatl, X Qin, A Prakash, C Zhang, L Cheng, Q Wang, N Lu, MJ Kim, ...
Nano letters 16 (9), 5437-5443, 2016
2482016
HfO2 on MoS2 by Atomic Layer Deposition: Adsorption Mechanisms and Thickness Scalability
S McDonnell, B Brennan, A Azcatl, N Lu, H Dong, C Buie, J Kim, ...
ACS nano 7 (11), 10354-10361, 2013
2332013
MoS2 functionalization for ultra-thin atomic layer deposited dielectrics
A Azcatl, S McDonnell, S KC, X Peng, H Dong, X Qin, R Addou, GI Mordi, ...
Applied Physics Letters 104 (11), 111601, 2014
1892014
Ozone adsorption on graphene: ab initio study and experimental validation
G Lee, B Lee, J Kim, K Cho
The Journal of Physical Chemistry C 113 (32), 14225-14229, 2009
1862009
Half-cycle atomic layer deposition reaction studies of on (100) surfaces
M Milojevic, FS Aguirre-Tostado, CL Hinkle, HC Kim, EM Vogel, J Kim, ...
Applied Physics Letters 93 (20), 202902, 2008
1762008
Large-Area Deposition of MoS2 by pulsed laser deposition with in situ thickness control
MI Serna, SH Yoo, S Moreno, Y Xi, JP Oviedo, H Choi, HN Alshareef, ...
ACS Nano 10 (6), 6054-6061, 2016
1622016
HfSe2 Thin Films: 2D Transition Metal Dichalcogenides Grown by Molecular Beam Epitaxy
R Yue, AT Barton, H Zhu, A Azcatl, LF Pena, J Wang, X Peng, N Lu, ...
ACS nano 9 (1), 474-480, 2015
1612015
Atomic layer deposition of dielectrics on graphene using reversibly physisorbed ozone
S Jandhyala, G Mordi, B Lee, G Lee, C Floresca, PR Cha, J Ahn, ...
ACS nano 6 (3), 2722-2730, 2012
1332012
Half-cycle atomic layer deposition reaction studies of Al2O3 on (NH4) 2S passivated GaAs (100) surfaces
M Milojevic, CL Hinkle, FS Aguirre-Tostado, HC Kim, EM Vogel, J Kim, ...
Applied Physics Letters 93 (25), 252905, 2008
1312008
Characteristics of high-k Al 2 O 3 dielectric using ozone-based atomic layer deposition for dual-gated graphene devices
B Lee, G Mordi, MJ Kim, YJ Chabal, EM Vogel, RM Wallace, KJ Cho, ...
Applied Physics Letters 97 (4), 043107-043107-3, 2010
1292010
Large ferroelectric polarization of TiN/Hf0.5Zr0.5O2/TiN capacitors due to stress-induced crystallization at low thermal budget
SJ Kim, D Narayan, JG Lee, J Mohan, JS Lee, J Lee, HS Kim, YC Byun, ...
Applied Physics Letters 111 (24), 242901, 2017
1272017
Remote Plasma Oxidation and Atomic Layer Etching of MoS2
H Zhu, X Qin, L Cheng, A Azcatl, J Kim, RM Wallace
ACS applied materials & interfaces 8 (29), 19119-19126, 2016
1242016
Frequency dispersion reduction and bond conversion on -type GaAs by in situ surface oxide removal and passivation
CL Hinkle, AM Sonnet, EM Vogel, S McDonnell, GJ Hughes, M Milojevic, ...
Applied Physics Letters 91 (16), 163512, 2007
1222007
Atomic layer deposition of dielectrics on Ge and III–V materials for ultrahigh performance transistors
RM Wallace, PC McIntyre, J Kim, Y Nishi
MRS bulletin 34 (7), 493-503, 2009
1152009
Comparison of the sputter rates of oxide films relative to the sputter rate of
DR Baer, MH Engelhard, AS Lea, P Nachimuthu, TC Droubay, J Kim, ...
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 28 (5 …, 2010
1122010
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