| Wafer-scale integration of two-dimensional materials in high-density memristive crossbar arrays for artificial neural networks S Chen, MR Mahmoodi, Y Shi, C Mahata, B Yuan, X Liang, C Wen, F Hui, ... Nature Electronics 3, 638-645, 2020 | 180 | 2020 |
| Graphene as an atomically thin barrier to Cu diffusion into Si J Hong, S Lee, S Lee, H Han, C Mahata, HW Yeon, B Koo, SI Kim, T Nam, ... Nanoscale 6 (13), 7503-7511, 2014 | 104 | 2014 |
| Textile-based electronic components for energy applications: principles, problems, and perspective V Kaushik, J Lee, J Hong, S Lee, S Lee, J Seo, C Mahata, T Lee Nanomaterials 5 (3), 1493-1531, 2015 | 86 | 2015 |
| Switchable water‐adhesive, superhydrophobic palladium‐layered Silicon nanowires potentiate the angiogenic efficacy of human stem cell spheroids J Seo, JS Lee, K Lee, D Kim, K Yang, S Shin, C Mahata, HB Jung, W Lee, ... Advanced Materials 26 (41), 7043-7050, 2014 | 76 | 2014 |
| Biomimetic-inspired micro-nano hierarchical structures for capacitive pressure sensor applications C Mahata, H Algadi, J Lee, S Kim, T Lee Measurement 151, 107095, 2020 | 75 | 2020 |
| Tin oxide for optoelectronic, photovoltaic and energy storage devices: a review GK Dalapati, H Sharma, A Guchhait, N Chakrabarty, P Bamola, Q Liu, ... Journal of Materials Chemistry A 9 (31), 16621-16684, 2021 | 71 | 2021 |
| Comparative Study of Atomic-Layer-Deposited Stacked (HfO2/Al2O3) and Nanolaminated (HfAlOx) Dielectrics on In0.53Ga0.47As C Mahata, YC Byun, CH An, S Choi, Y An, H Kim ACS Applied Materials & Interfaces 5 (10), 4195-4201, 2013 | 65 | 2013 |
| Long-term and short-term plasticity of Ta2O5/HfO2 memristor for hardware neuromorphic application JH Ryu, C Mahata, S Kim Journal of Alloys and Compounds 850, 156675, 2021 | 50 | 2021 |
| Resistive switching and synaptic behaviors of an HfO2/Al2O3 stack on ITO for neuromorphic systems C Mahata, C Lee, Y An, MH Kim, S Bang, CS Kim, JH Ryu, S Kim, H Kim, ... Journal of Alloys and Compounds 826, 154434, 2020 | 47 | 2020 |
| Capillary force-induced glue-free printing of Ag nanoparticle arrays for highly sensitive SERS substrates J Lee, J Seo, D Kim, S Shin, S Lee, C Mahata, HS Lee, BW Min, T Lee ACS applied materials & interfaces 6 (12), 9053-9060, 2014 | 42 | 2014 |
| Effect of interlayer on resistive switching properties of SnO2-based memristor for synaptic application MK Rahmani, M Ismail, C Mahata, S Kim Results in Physics 18, 103325, 2020 | 40 | 2020 |
| Synaptic characteristics of amorphous boron nitride-based memristors on a highly doped silicon substrate for neuromorphic engineering J Lee, JH Ryu, B Kim, F Hussain, C Mahata, E Sim, M Ismail, Y Abbas, ... ACS applied materials & interfaces 12 (30), 33908-33916, 2020 | 40 | 2020 |
| Atomic layer deposition of Y-stabilized ZrO2 for advanced DRAM capacitors BE Park, IK Oh, C Mahata, CW Lee, D Thompson, WJ Maeng, H Kim Journal of Alloys and Compounds 722, 307-312, 2017 | 40 | 2017 |
| TiO2/GeOxNy stacked gate dielectrics for Ge-MOSFETs MK Bera, C Mahata, AK Chakraborty, SK Nandi, JN Tiwari, JY Hung, ... Semiconductor science and technology 22 (12), 1352, 2007 | 40 | 2007 |
| Atomic layer deposited (TiO2)x(Al2O3)1−x/In0.53Ga0.47As gate stacks for III-V based metal-oxide-semiconductor field-effect transistor applications C Mahata, S Mallik, T Das, CK Maiti, GK Dalapati, CC Tan, CK Chia, ... Applied Physics Letters 100 (6), 062905, 2012 | 39 | 2012 |
| Demonstration of synaptic and resistive switching characteristics in W/TiO2/HfO2/TaN memristor crossbar array for bioinspired neuromorphic computing M Ismail, U Chand, C Mahata, J Nebhen, S Kim Journal of Materials Science & Technology 96, 94-102, 2022 | 38 | 2022 |
| Multi-level analog resistive switching characteristics in tri-layer HfO2/Al2O3/HfO2 based memristor on ITO electrode C Mahata, M Kang, S Kim Nanomaterials 10 (10), 2069, 2020 | 38 | 2020 |
| Modified resistive switching performance by increasing Al concentration in HfO2 on transparent indium tin oxide electrode C Mahata, S Kim Ceramics International 47, 1199-1207, 2021 | 34 | 2021 |
| Zinc tin oxide synaptic device for neuromorphic engineering JH Ryu, B Kim, F Hussain, M Ismail, C Mahata, T Oh, M Imran, KK Min, ... IEEE Access 8, 130678-130686, 2020 | 34 | 2020 |
| Forming-free Pt/Al2O3/HfO2/HfAlOx/TiN memristor with controllable multilevel resistive switching and neuromorphic characteristics for artificial synapse M Ismail, C Mahata, S Kim Journal of Alloys and Compounds 892, 162141, 2022 | 33 | 2022 |
Sungjun KimDivision of Electronics and Electrical Engineering, Dongguk UniversityVerified email at dongguk.edu
