| In Situ XPS Chemical Analysis of MnSiO3 Copper Diffusion Barrier Layer Formation and Simultaneous Fabrication of Metal Oxide Semiconductor Electrical Test … C Byrne, B Brennan, AP McCoy, J Bogan, A Brady, G Hughes ACS applied materials & interfaces 8 (4), 2470-2477, 2016 | 27 | 2016 |
| H2O2-assisted photoelectrocatalytic degradation of Mitoxantrone using CuO nanostructured films: Identification of by-products and toxicity APP da Rosa, RP Cavalcante, DA da Silva, LM da Silva, TF da Silva, ... Science of the Total Environment 651, 2845-2856, 2019 | 26 | 2019 |
| On the use of (3-trimethoxysilylpropyl) diethylenetriamine self-assembled monolayers as seed layers for the growth of Mn based copper diffusion barrier layers A Brady-Boyd, R O’Connor, S Armini, V Selvaraju, G Hughes, J Bogan Applied Surface Science 427, 260-266, 2018 | 18 | 2018 |
| Nucleation and adhesion of ultra-thin copper films on amino-terminated self-assembled monolayers J Bogan, A Brady-Boyd, S Armini, R Lundy, V Selvaraju, R O'Connor Applied Surface Science 462, 38-47, 2018 | 14 | 2018 |
| Physical, chemical and electrical characterisation of the diffusion of copper in silicon dioxide and prevention via a CuAl alloy barrier layer system C Byrne, B Brennan, R Lundy, J Bogan, A Brady, YY Gomeniuk, ... Materials Science in Semiconductor Processing 63, 227-236, 2017 | 8 | 2017 |
| Oxidation of ruthenium thin films using atomic oxygen AP McCoy, J Bogan, A Brady, G Hughes Thin Solid Films 597, 112-116, 2015 | 6 | 2015 |
| Investigation of nitrogen incorporation into manganese based copper diffusion barrier layers for future interconnect applications V Selvaraju, A Brady-Boyd, R O'Connor, G Hughes, J Bogan Surfaces and Interfaces 13, 133-138, 2018 | 5 | 2018 |
| Chemical and electrical characterisation of the segregation of Al from a CuAl alloy (90%: 10% wt) with thermal anneal C Byrne, A Brady, L Walsh, AP McCoy, J Bogan, E McGlynn, KV Rajani, ... Thin Solid Films 599, 59-63, 2016 | 3 | 2016 |
| The role of atomic oxygen in the decomposition of self-assembled monolayers during area-selective atomic layer deposition A Brady-Boyd, R O'Connor, S Armini, V Selvaraju, M Pasquali, G Hughes, ... Applied Surface Science 586, 152679, 2022 | | 2022 |
| Photoemission Studies on the Efficacy of Self-assembled Monolayers for use in Transistor Interconnect Applications A Brady-Boyd | | 2018 |
| Characterisation of Electroless Deposited Cobalt by Hard and Soft X-ray Photoemission Spectroscopy A Brady-Boyd, R O'Connor, S Armini, S Selvaraju, G Hughes, J Bogan 2018 IEEE 18th International Conference on Nanotechnology (IEEE-NANO), 1-4, 2018 | | 2018 |
| On the use of (3-trimethoxysilylpropyl) diethylenetriamine self-assembled monolayers as seed layers for the growth of Mn based copper diffusion barrier layers J Bodgan, A Brady-Boyd, R O'Connor, S Armini, V Selvaraju, G Hughes | | 2018 |
| Synchrotron radiation study of metallic titanium deposited on dielectric substrates J Bogan, V Selvaraju, A Brady-Boyd, G Hughes, R O'Connor Journal of Vacuum Science & Technology B 36 (4), 040602, 2018 | | 2018 |
| Characterisation of CuAl alloy for future interconnect technologies C Byrne, AP McCoy, J Bogan, A Brady, G Hughes 2015 IEEE International Interconnect Technology Conference and 2015 IEEE …, 2015 | | 2015 |
Justin BoganDublin City UniversityVerified email at mail.dcu.ie
