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Tatiana Kovalevich
Tatiana Kovalevich
Verified email at imec.be
Title
Cited by
Cited by
Year
Magnetic spin–orbit interaction of light
M Wang, H Zhang, T Kovalevich, R Salut, MS Kim, MA Suarez, MP Bernal, ...
Light: Science & Applications 7 (1), 24, 2018
402018
Polarization controlled directional propagation of Bloch surface wave
T Kovalevich, P Boyer, M Suarez, R Salut, MS Kim, HP Herzig, MP Bernal, ...
Optics Express 25 (5), 5710-5715, 2017
372017
Tunable Bloch surface waves in anisotropic photonic crystals based on lithium niobate thin films
T Kovalevich, A Ndao, M Suarez, S Tumenas, Z Balevicius, ...
Optics Letters 41 (23), 5616-5619, 2016
352016
Bloch surface waves at the telecommunication wavelength with lithium niobate as the top layer for integrated optics
T Kovalevich, D Belharet, L Robert, G Ulliac, MS Kim, HP Herzig, ...
Applied optics 58 (7), 1757-1762, 2019
292019
Experimental evidence of Bloch surface waves on photonic crystals with thin-film LiNbO3 as a top layer
T Kovalevich, D Belharet, L Robert, MS Kim, HP Herzig, T Grosjean, ...
Photonics research 5 (6), 649-653, 2017
252017
Experimental evidence of Bloch surface waves on photonic crystals with thin-film LiNbO3 as a top layer
T Kovalevich, D Belharet, L Robert, MS Kim, HP Herzig, T Grosjean, ...
Photonics research 5 (6), 649-653, 2017
252017
Metal layer single EUV expose at pitch 28 nm: how bright field and NTD resist advantages align
JH Franke, A Frommhold, N Davydova, R Aubert, VV Nair, T Kovalevich, ...
Extreme Ultraviolet (EUV) Lithography XII 11609, 43-62, 2021
172021
Resist and reticle activities towards High-NA EUV ecosystem readiness
J Santaclara, W Gao, E Hendrickx, V Wiaux, JH Franke, E Gallagher, ...
Optical and EUV Nanolithography XXXV, PC1205105, 2022
52022
Overview of stitching for high NA: imaging and overlay experimental and simulation results
N Davydova, L van Look, V Wiaux, J Bekaert, F Timmermans, ...
Optical and EUV Nanolithography XXXVI 12494, 233-251, 2023
32023
Stitching for High NA: new insights and path forward
NV Davydova, V Wiaux, J Bekaert, FJ Timmermans, B Slachter, ...
International Conference on Extreme Ultraviolet Lithography 2022, PC1229210, 2022
32022
Stitching enablement for anamorphic imaging: a~ 1μm exclusion band and its implications
V Wiaux, J Bekaert, T Kovalevich, J Ryckaert, E Hendrickx, N Davydova, ...
Extreme Ultraviolet Lithography 2020 11517, 76-83, 2020
32020
Evaluation of Lines and Spaces printing and general understanding of imaging with dark field low-n mask
T Kovalevich, L Van Look, JH Franke, V Philipsen
Journal of Micro/Nanopatterning, Materials, and Metrology 22 (2), 024401-024401, 2023
22023
Critical pattern behavior at nanometer scale vicinity of black border
T Kovalevich, J Bekaert, V Wiaux, J Liddle, N Davydova, MC Tien
22019
Evaluation of LS printing and general understanding of imaging with DF low-n mask
T Kovalevich, L Van Look, JH Franke, V Philipsen
International Conference on Extreme Ultraviolet Lithography 2022, PC122920M, 2022
12022
Tunable Bloch surface waves devices
T Kovalevich
arXiv preprint arXiv:1807.05268, 2018
12018
Imaging validation for LS of dark field low-n vs Ta-based absorber masks
T Kovalevich, L Van Look, A Moussa, JH Franke, V Philipsen
International Conference on Extreme Ultraviolet Lithography 2023 12750, 2023
2023
Mask roughness contribution to wafer edge placement error
A Frommhold, JH Franke, T Kovalevich, E Van Setten, V Vaenkatesan
Optical and EUV Nanolithography XXXVI 12494, 53-60, 2023
2023
Spatial frequency breakdown of CD variation
T Kovalevich, B Witek, D Riggs, J Bekaert, L Van Look, MJ Maslow
37th European Mask and Lithography Conference 12472, 84-89, 2022
2022
Logic via printability enhancement using restricted via placement and exhaustive SRAF placement on a staggered grid
P Wöltgens, A Colina, D Rio, M Delorme, T Kovalevich, A Thiam, ...
Optical and EUV Nanolithography XXXV 12051, 155-160, 2022
2022
Magnetic Spin-Locking of Light
M Wang, H Zhang, T Kovalevich, R Salut, MS Kim, MAA Suarez, ...
International Congress on Artificial Materials for Novel Wave Phenomena …, 2019
2019
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