Dmitry Vengertsev
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인용
연도
Consensus of output-coupled high-order linear multi-agent systems under deterministic and Markovian switching networks
D Vengertsev, H Kim, JH Seo, H Shim
International Journal of Systems Science 46 (10), 1790-1799, 2015
262015
The new test pattern selection method for OPC model calibration, based on the process of clustering in a hybrid space
D Vengertsev, K Kim, SH Yang, S Shim, S Moon, A Shamsuarov, S Lee, ...
Proc. of SPIE Vol 8522, 85221A-1, 2012
242012
Consensus of output-coupled linear multi-agent systems under frequently connected network
D Vengertsev, H Kim, H Shim, JH Seo
49th IEEE Conference on Decision and Control (CDC), 4559-4564, 2010
242010
Generative learning for realistic and ground rule clean hot spot synthesis
IC Graur, IP Stobert, DA Vengertsev
US Patent 9,690,898, 2017
182017
Deep Learning Architecture for Univariate Time Series Forecasting
D Vengertsev
Technical Report, Stanford, 2014
132014
Anomaly Detection in Graph: Unsupervised Learning, Graph-based Features and Deep Architecture
D Vengertsev, H Thakkar
http://web.stanford.edu/class/cs224w/projects_2015 …, 2015
102015
Method for detecting defect in pattern
KH Kim, CHI Kai-Yuan, D Vengertsev, S Yang
US Patent 9,542,740, 2017
62017
Network router having an internal automated backup
AD Mitchell
US Patent 7,028,224, 2006
62006
Semiconductor wafer inspection using care area group-specific threshold settings for detecting defects.
DAV Parul Dhagat, Ananthan Raghunathan, Vikas Sachan
US Patent 10,146,036, 2017
5*2017
New method of detection and classification of yield-impacting EUV mask defects
I Graur, D Vengertsev, A Raghunathan, I Stobert, J Rankin
Photomask Technology 2015 9635, 96350M, 2015
52015
Test pattern selection method for OPC model calibration
D Vengertsev, S Moon, A Shamsuarov, S Yang, M Jeong
US Patent 8,677,288, 2014
32014
Recurrent Neural Network Properties and their Verification with Monte Carlo Techniques
D Vengertsev, E Sherman
Proceedings of the Workshop on Artificial Intelligence Safety, 34th AAAI …, 2020
22020
The effect of mask and source complexity on source mask optimization
SH Yang, N Jia, SB Shim, D Vengertsev, J Choi, HK Kang, YC Kim
Optical Microlithography XXVI 8683, 86830C, 2013
12013
MACHINE LEARNING MODELS BASED ON ALTERED DATA AND SYSTEMS AND METHODS FOR TRAINING AND USING THE SAME
D Vengertsev, Z Hosseinimakarem, J Harms
US Patent https://patents.justia.com/patent/20,210,201,195, 2021
2021
Apparatuses and methods for determining wafer defects
Y Gong, D Vengertsev, SA Eichmeyer, J Gong
US Patent App. 16/925,243, 2021
2021
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학술자료 1–15