| Apparatus and method for modifying an object BF Hopkins, DJ Ray, JE Leclaire, R White US Patent 7,323,699, 2008 | 25 | 2008 |
| Repair of step and flash imprint lithography templates WJ Dauksher, KJ Nordquist, NV Le, KA Gehoski, DP Mancini, DJ Resnick, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004 | 25 | 2004 |
| Use of nanomachining for 100-nm mask repair B LoBianco, R White, T Nawrocki 22nd Annual BACUS Symposium on Photomask Technology 4889, 909-921, 2002 | 21 | 2002 |
| Use of nanomachining as a technique to reduce scrap of high-end photomasks R White, M Verbeek, R Bozak, M Klos 21st Annual BACUS Symposium on Photomask Technology 4562, 213-224, 2002 | 21 | 2002 |
| Through-focus EUV multilayer defect repair with nanomachining G McIntyre, E Gallagher, T Robinson, AC Smith, M Lawliss, J LeClaire, ... Extreme Ultraviolet (EUV) Lithography IV 8679, 413-431, 2013 | 19 | 2013 |
| Apparatus and method for modifying an object BF Hopkins, DJ Ray, JE Leclaire, R White US Patent 7,495,240, 2009 | 16 | 2009 |
| DER_SNR: A Simple & General Spectroscopic Signal-to-Noise Measurement Algorithm F Stoehr, D Fraquelli, I Kamp, T Kimball, K Levay, T Rogers, M Smith, ... Space Telescope European Coordinating Facility Newsletter 42, 4, 2007 | 15 | 2007 |
| EUVL mask repair: expanding options with nanomachining E Gallagher, G McIntyre, M Lawliss, T Robinson, R Bozak, R White, ... Photomask Technology 2012 8522, 463-470, 2012 | 13 | 2012 |
| Inspection and repair issues for step and flash imprint lithography templates KJ Nordquist, WJ Dauksher, DP Mancini, DJ Resnick, HF Hess, ... 24th Annual BACUS Symposium on Photomask Technology 5567, 853-863, 2004 | 13 | 2004 |
| Investigation of nanomachining as a technique for geometry reconstruction D Brinkley, R Bozak, B Chiu, C Ly, V Tolani, R White 22nd Annual BACUS Symposium on Photomask Technology 4889, 232-240, 2002 | 10 | 2002 |
| Femtopulse laser-based mask repair in the DUV wavelength regime F Ghadiali, V Tolani, R Nagpal, T Robinson, J LeClaire, R Bozak, DA Lee, ... Photomask and Next-Generation Lithography Mask Technology XIII 6283, 613-624, 2006 | 9 | 2006 |
| High-precision mask repair using nanomachining M Verbeek, R White, M Klos 18th European Conference on Mask Technology for Integrated Circuits and …, 2002 | 9 | 2002 |
| Clean and repair of EUV photomasks T Robinson, D Yi, D Brinkley, K Roessler, R White, R Bozak, M Archuletta, ... Photomask Technology 2011 8166, 420-429, 2011 | 8 | 2011 |
| Use of nanomachining for subtractive repair of EUV and other challenging mask defects D Brinkley, R White, R Bozak, T Liang, G Liu Photomask and Next-Generation Lithography Mask Technology IX 4754, 900-911, 2002 | 8 | 2002 |
| Defect repair performance using the nanomachining repair technique Y Morikawa, H Kokubo, M Nishiguchi, N Hayashi, R White, R Bozak, ... Photomask and Next-Generation Lithography Mask Technology X 5130, 520-527, 2003 | 7 | 2003 |
| Astrophysics Source Code Library CE Brasseur, C Phillip, SW Fleming, SE Mullally, RL White | 5 | 2019 |
| New tools to enable photomask repair to the 32nm node T Robinson, R White, R Bozak, K Roessler, B Arruza, D Hogle, ... Photomask Technology 2009 7488, 129-140, 2009 | 5 | 2009 |
| Nanomachining photomask repair of complex patterns T Robinson, A Dinsdale, M Archuletta, R Bozak, R White Photomask Technology 2008 7122, 498-508, 2008 | 5 | 2008 |
| Nanomachining processes for 45, 32 nm node mask repair and beyond T Robinson, A Dinsdale, R Bozak, R White, M Archuletta Photomask and Next-Generation Lithography Mask Technology XV 7028, 401-413, 2008 | 5 | 2008 |
| Precise and high-throughput femtopulse laser mask repair of large defects R White, J LeClaire, T Robinson, A Dinsdale, R Bozak, DA Lee Photomask Technology 2006 6349, 1294-1304, 2006 | 5 | 2006 |
