Follow
Hai Jiang
Hai Jiang
Samsung Electronics, Purdue University, Peking University
Verified email at samsung.com - Homepage
Title
Cited by
Cited by
Year
The Impact of Self-Heating on HCI Reliability in High-Performance Digital Circuits
H Jiang, SH Shin, X Liu, X Zhang, MA Alam
IEEE Electron Device Letters 38 (4), 430-433, 2017
472017
A device-to-system perspective regarding self-heating enhanced hot carrier degradation in modern field-effect transistors: A topical review
MA Alam, BK Mahajan, YP Chen, W Ahn, H Jiang, SH Shin
IEEE Transactions on Electron Devices 66 (11), 4556-4565, 2019
412019
Characterization of self-heating leads to universal scaling of HCI degradation of multi-fin SOI FinFETs
H Jiang, SH Shin, X Liu, X Zhang, MA Alam
2016 IEEE International Reliability Physics Symposium (IRPS), 2A-3-1-2A-3-7, 2016
402016
Integrated modeling of self-heating of confined geometry (FinFET, NWFET, and NSHFET) transistors and its implications for the reliability of sub-20 nm modern integrated circuits
W Ahn, SH Shin, C Jiang, H Jiang, MA Wahab, MA Alam
Microelectronics Reliability 81, 262-273, 2018
382018
Investigation of self-heating effect on hot carrier degradation in multiple-fin SOI FinFETs
H Jiang, X Liu, N Xu, Y He, G Du, X Zhang
IEEE Electron Device Letters 36 (12), 1258-1260, 2015
372015
Experimental investigation of self heating effect (SHE) in multiple-fin SOI FinFETs
H Jiang, N Xu, B Chen, L Zeng, Y He, G Du, X Liu, X Zhang
Semiconductor Science and Technology 29 (11), 115021, 2014
322014
RTN based oxygen vacancy probing method for Ox-RRAM reliability characterization and its application in tail bits
P Huang, DB Zhu, C Liu, Z Zhou, Z Dong, H Jiang, WS Shen, LF Liu, ...
2017 IEEE International Electron Devices Meeting (IEDM), 21.4. 1-21.4. 4, 2017
282017
A novel synthesis of Rent's rule and effective-media theory predicts FEOL and BEOL reliability of self-heated ICs
W Ahn, H Jiang, SH Shin, MA Alam
Electron Devices Meeting (IEDM), 2016 IEEE International, 7.1. 1-7.1. 4, 2016
242016
Enhanced reliability of 7-nm process technology featuring EUV
K Choi, HC Sagong, W Kang, H Kim, J Hai, M Lee, B Kim, M Lee, S Lee, ...
IEEE Transactions on Electron Devices 66 (12), 5399-5403, 2019
192019
Performance potential of Ge CMOS technology from a material-device-circuit perspective
SH Shin, H Jiang, W Ahn, H Wu, W Chung, DY Peide, MA Alam
IEEE Transactions on Electron Devices 65 (5), 1679-1684, 2018
172018
Reliability on evolutionary FinFET CMOS technology and beyond
K Choi, HC Sagong, M Jin, J Hai, M Lee, T Jeong, MS Yeo, H Shim, ...
2020 IEEE International Electron Devices Meeting (IEDM), 9.3. 1-9.3. 4, 2020
112020
Comprehensive understanding of hot carrier degradation in multiple-fin SOI FinFETs
H Jiang, L Yin, Y Li, N Xu, K Zhao, Y He, G Du, X Liu, X Zhang
2015 IEEE International Reliability Physics Symposium, XT. 6.1-XT. 6.4, 2015
102015
Unified self-heating effect model for advanced digital and analog technology and thermal-aware lifetime prediction methodology
H Jiang, L Shen, SH Shin, N Xu, G Du, BY Nguyen, O Faynot, MA Alam, ...
2017 Symposium on VLSI Technology, T136-T137, 2017
92017
Investigating of SER in 28 nm FDSOI-Planar and Comparing with SER in Bulk-FinFET
T Uemura, B Chung, J Jo, H Jiang, Y Ji, TY Jeong, R Ranjan, Y Park, ...
2020 IEEE International Reliability Physics Symposium (IRPS), 1-5, 2020
82020
Impact of self-heating effects on nanoscale Ge p-channel FinFETs with Si substrate
L Yin, L Shen, H Jiang, G Du, X Liu
Science China Information Sciences 61, 1-9, 2018
82018
Advanced self-heating model and methodology for layout proximity effect in FinFET technology
H Jiang, H Sagong, J Kim, H Shim, Y Kim, J Park, T Uemura, Y Ji, T Jeong, ...
2020 IEEE International Reliability Physics Symposium (IRPS), 1-5, 2020
72020
Localized layout effect related reliability approach in 8nm FinFETs technology: From transistor to circuit
H Jiang, H Sagong, J Kim, J Park, S Shin, S Pae
2019 IEEE International Reliability Physics Symposium (IRPS), 1-5, 2019
72019
Reliability of industrial grade embedded-STT-MRAM
Y Ji, H Goo, J Lim, TY Jeong, T Uemura, GR Kim, BI Seo, S Lee, G Park, ...
2020 IEEE International Reliability Physics Symposium (IRPS), 1-3, 2020
52020
Reliability investigation of high-k/metal gate in nMOSFETs by three-dimensional kinetic Monte-Carlo simulation with multiple trap interactions
Y Li, H Jiang, Z Lun, Y Wang, P Huang, H Hao, G Du, X Zhang, X Liu
Japanese Journal of Applied Physics 55 (4S), 04ED15, 2016
42016
3D KMC reliability simulation of nano-scaled HKMG nMOSFETs with multiple traps coupling
Y Li, Z Lun, P Huang, Y Wang, H Jiang, G Du, X Liu
2015 International Conference on Simulation of Semiconductor Processes and …, 2015
42015
The system can't perform the operation now. Try again later.
Articles 1–20