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Sangwoo kim
Sangwoo kim
Verified email at hanyang.ac.kr
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Year
Low temperature thermal atomic layer deposition of aluminum nitride using hydrazine as the nitrogen source
YC Jung, SM Hwang, DN Le, ALN Kondusamy, J Mohan, SW Kim, JH Kim, ...
Materials 13 (15), 3387, 2020
182020
Application of single-pulse charge pumping method on evaluation of indium gallium zinc oxide thin-film transistors
MC Nguyen, AHT Nguyen, H Ji, J Cheon, JH Kim, KM Yu, SY Cho, ...
IEEE Transactions on Electron Devices 65 (9), 3786-3790, 2018
162018
Electrical characterization of the self-heating effect in oxide semiconductor thin-film transistors using pulse-based measurements
MC Nguyen, N On, H Ji, AHT Nguyen, S Choi, J Cheon, KM Yu, SY Cho, ...
IEEE Transactions on Electron Devices 65 (6), 2492-2497, 2018
152018
Ferroelectric field-effect transistors for binary neural network with 3-D NAND architecture
GH Lee, MS Song, S Kim, J Yim, S Hwang, J Yu, D Kwon, H Kim
IEEE Transactions on Electron Devices 69 (11), 6438-6445, 2022
112022
Solution-processed Rb-doped indium zinc oxide thin-film transistors
SW Kim, MC Nguyen, AHT Nguyen, SJ Choi, HM Ji, JG Cheon, KM Yu, ...
IEEE Electron Device Letters 39 (9), 1330-1333, 2018
82018
Effects of oxygen vacancies on ferroelectric characteristics of RF-sputtered Hf0. 5Zr0. 5O2
C Han, KR Kwon, J Kim, J Yim, S Kim, EC Park, JW You, S Jeong, R Choi, ...
Materials Science in Semiconductor Processing 160, 107401, 2023
42023
Effects of RTA Rising Time on Ferroelectric Characteristics of HfZrO2
C Han, SJ Kwon, J Yim, J Kim, S Kim, S Jeong, EC Park, JW You, R Choi, ...
IEEE Transactions on Electron Devices 69 (6), 3499-3502, 2022
42022
Ferroelectric Field-Effect Transistor Synaptic Device with Hafnium-silicate Interlayer
SW Kim, W Shin, M Kim, KR Kwon, J Yim, J Kim, C Han, S Jeong, EC Park, ...
IEEE Electron Device Letters, 2023
22023
Ferroelectric polarization-switching acceleration of sputtered Hf0. 5Zr0. 5O2 with defect-induced polarization of interlayer
C Han, J Yim, A Nguyen, J Kim, KR Kwon, S Kim, S Jeong, EC Park, ...
Journal of Alloys and Compounds 960, 170516, 2023
12023
Unraveling threshold voltage instability in ferroelectric junctionless FETs using low-frequency noise measurement with base bias
W Shin, RH Koo, S Kim, D Kwon, JJ Kim, D Kwon, JH Lee
IEEE Electron Device Letters, 2023
12023
Channel-Length-Dependent Low-Frequency Noise Characteristics of Ferroelectric Junctionless Poly-Si Thin-Film Transistors
W Shin, S Kim, RH Koo, D Kwon, JJ Kim, DH Kwon, D Kwon, JH Lee
IEEE Electron Device Letters, 2023
12023
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Articles 1–11