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Woo-Hee Kim
Woo-Hee Kim
Assistant Professor at Hanyang University
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Ru nanostructure fabrication using an anodic aluminum oxide nanotemplate and highly conformal Ru atomic layer deposition
WH Kim, SJ Park, JY Son, H Kim
Nanotechnology 19 (4), 045302, 2008
1132008
Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
SJ Park, WH Kim, WJ Maeng, H Kim
Microelectronic engineering 85 (1), 39-44, 2008
1102008
Atomic Layer Deposition of Ni Thin Films and Application to Area Selective Deposition
WH Kim, K Heo, YK Lee, TM Chung, CG Kim, S Hong, J Heo, H Kim
Journal of The Electrochemical Society 158 (1), D1-D5, 2011
982011
Area-selective atomic layer deposition of metal oxides on noble metals through catalytic oxygen activation
JA Singh, NFW Thissen, WH Kim, H Johnson, WMM Kessels, AA Bol, ...
Chemistry of Materials 30 (3), 663-670, 2018
962018
A Process for Topographically Selective Deposition on 3D Nanostructures by Ion Implantation
WH Kim, FS Minaye Hashemi, AJM Mackus, J Singh, Y Kim, ...
ACS nano 10 (4), 4451-4458, 2016
842016
High Quality Area-Selective Atomic Layer Deposition Co Using Ammonia Gas as a Reactant
HBR Lee, WH Kim, JW Lee, JM Kim, K Heo, IC Hwang, Y Park, S Hong, ...
Journal of The Electrochemical Society 157 (1), D10-D15, 2010
842010
Low-temperature Atomic Layer Deposition of TiO2, Al2O3, and ZnO Thin Films
T Nam, J Kim, M Kim, H Kim, W Kim
Journal of the Korean Physical Society, 59 (2), 452-457, 2011
792011
Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
WH Kim, WJ Maeng, KJ Moon, JM Myoung, H Kim
Thin Solid Films 519 (1), 362-366, 2010
682010
Incomplete elimination of precursor ligands during atomic layer deposition of zinc-oxide, tin-oxide, and zinc-tin-oxide
AJM Mackus, C MacIsaac, WH Kim, SF Bent
The Journal of Chemical Physics 146, 052802, 2016
672016
Area-selective atomic layer deposition using Si precursors as inhibitors
R Khan, B Shong, BG Ko, JK Lee, H Lee, JY Park, IK Oh, SS Raya, ...
Chemistry of Materials 30 (21), 7603-7610, 2018
642018
Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al2O3 Nanopatterns
S Seo, BC Yeo, SS Han, CM Yoon, JY Yang, J Yoon, C Yoo, H Kim, Y Lee, ...
ACS applied materials & interfaces 9 (47), 41607–41617, 2017
622017
Effect oxygen exposure on the quality of atomic layer deposition of ruthenium from bis(cyclopentadienyl)ruthenium and oxygen
SJ Park, WH Kim, WJ Maeng, YS Yang, CG Park, H Kim, KN Lee, ...
Thin Solid Films 516 (21), 7345-7349, 2008
622008
Plasma-Enhanced Atomic Layer Deposition of Ni
HBR Lee, SH Bang, WH Kim, GH Gu, YK Lee, TM Chung, CG Kim, ...
Japanese Journal of Applied Physics 49 (5S2), 05FA11, 2010
602010
Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
WH Kim, SJ Park, D Kim, H Kim
Journal of the Korean Physical Society 55 (1), 32-37, 2009
592009
2D transition metal dichalcogenide heterostructures for p‐and n‐type photovoltaic self‐powered gas sensor
Y Kim, S Lee, JG Song, KY Ko, WJ Woo, SW Lee, M Park, H Lee, Z Lee, ...
Advanced Functional Materials 30 (43), 2003360, 2020
582020
Atomic layer deposition of Y2O3 and yttrium-doped HfO2 using a newly synthesized Y(iPrCp)2(N-iPr-amd) precursor for a high permittivity gate dielectric
WH Kim, IK Oh, MK Kim, G Lee, CW Lee, J Park, C Lansalot-Matras, ...
Applied Surface Science 297, 16-21, 2014
532014
Low pressure chemical vapor deposition of aluminum-doped zinc oxide for transparent conducting electrodes
WH Kim, WJ Maeng, MK Kim, H Kim
Journal of The Electrochemical Society 158 (8), D495, 2011
492011
The effects of La substitution on ferroelectric domain structure and multiferroic properties of epitaxially grown BiFeO3 thin films
WH Kim, JY Son
Applied Physics Letters 103 (13), 132907, 2013
422013
Electronic structure of cerium oxide gate dielectric grown by plasma-enhanced atomic layer deposition
WH Kim, WJ Maeng, MK Kim, J Gatineau, H Kim
Journal of The Electrochemical Society 158 (10), G217-G220, 2011
422011
Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
WH Kim, MK Kim, WJ Maeng, J Gatineau, V Pallem, C Dussarrat, A Noori, ...
Journal of The Electrochemical Society 158 (8), G169-G172, 2011
422011
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