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Woo-Hee Kim
Woo-Hee Kim
Assistant Professor at Hanyang University
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2D transition metal dichalcogenide heterostructures for p‐and n‐type photovoltaic self‐powered gas sensor
Y Kim, S Lee, JG Song, KY Ko, WJ Woo, SW Lee, M Park, H Lee, Z Lee, ...
Advanced Functional Materials 30 (43), 2003360, 2020
1432020
Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
SJ Park, WH Kim, WJ Maeng, H Kim
Microelectronic engineering 85 (1), 39-44, 2008
1252008
Ru nanostructure fabrication using an anodic aluminum oxide nanotemplate and highly conformal Ru atomic layer deposition
WH Kim, SJ Park, JY Son, H Kim
Nanotechnology 19 (4), 045302, 2008
1202008
Area-selective atomic layer deposition of metal oxides on noble metals through catalytic oxygen activation
JA Singh, NFW Thissen, WH Kim, H Johnson, WMM Kessels, AA Bol, ...
Chemistry of Materials 30 (3), 663-670, 2018
1192018
Atomic Layer Deposition of Ni Thin Films and Application to Area Selective Deposition
WH Kim, K Heo, YK Lee, TM Chung, CG Kim, S Hong, J Heo, H Kim
Journal of The Electrochemical Society 158 (1), D1-D5, 2011
1052011
Area-selective atomic layer deposition using Si precursors as inhibitors
R Khan, B Shong, BG Ko, JK Lee, H Lee, JY Park, IK Oh, SS Raya, ...
Chemistry of Materials 30 (21), 7603-7610, 2018
992018
A Process for Topographically Selective Deposition on 3D Nanostructures by Ion Implantation
WH Kim, FS Minaye Hashemi, AJM Mackus, J Singh, Y Kim, ...
ACS nano 10 (4), 4451-4458, 2016
992016
Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al2O3 Nanopatterns
S Seo, BC Yeo, SS Han, CM Yoon, JY Yang, J Yoon, C Yoo, H Kim, Y Lee, ...
ACS applied materials & interfaces 9 (47), 41607–41617, 2017
952017
High Quality Area-Selective Atomic Layer Deposition Co Using Ammonia Gas as a Reactant
HBR Lee, WH Kim, JW Lee, JM Kim, K Heo, IC Hwang, Y Park, S Hong, ...
Journal of The Electrochemical Society 157 (1), D10-D15, 2010
952010
Incomplete elimination of precursor ligands during atomic layer deposition of zinc-oxide, tin-oxide, and zinc-tin-oxide
AJM Mackus, C MacIsaac, WH Kim, SF Bent
The Journal of Chemical Physics 146, 052802, 2016
842016
Low-temperature Atomic Layer Deposition of TiO2, Al2O3, and ZnO Thin Films
T Nam, J Kim, M Kim, H Kim, W Kim
Journal of the Korean Physical Society, 59 (2), 452-457, 2011
842011
Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
WH Kim, WJ Maeng, KJ Moon, JM Myoung, H Kim
Thin Solid Films 519 (1), 362-366, 2010
772010
Effect oxygen exposure on the quality of atomic layer deposition of ruthenium from bis(cyclopentadienyl)ruthenium and oxygen
SJ Park, WH Kim, WJ Maeng, YS Yang, CG Park, H Kim, KN Lee, ...
Thin Solid Films 516 (21), 7345-7349, 2008
682008
Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
WH Kim, SJ Park, D Kim, H Kim
Journal of the Korean Physical Society 55 (1), 32-37, 2009
662009
Atomic layer deposition of Y2O3 and yttrium-doped HfO2 using a newly synthesized Y(iPrCp)2(N-iPr-amd) precursor for a high permittivity gate dielectric
WH Kim, IK Oh, MK Kim, G Lee, CW Lee, J Park, C Lansalot-Matras, ...
Applied Surface Science 297, 16-21, 2014
652014
Plasma-Enhanced Atomic Layer Deposition of Ni
HBR Lee, SH Bang, WH Kim, GH Gu, YK Lee, TM Chung, CG Kim, ...
Japanese Journal of Applied Physics 49 (5S2), 05FA11, 2010
652010
Low pressure chemical vapor deposition of aluminum-doped zinc oxide for transparent conducting electrodes
WH Kim, WJ Maeng, MK Kim, H Kim
Journal of The Electrochemical Society 158 (8), D495, 2011
562011
Semiconductor devices and methods of fabricating semiconductor devices
KH Kim, J Lee, WH Kim, N Lee
US Patent App. 14/489,900, 2015
542015
Electronic structure of cerium oxide gate dielectric grown by plasma-enhanced atomic layer deposition
WH Kim, WJ Maeng, MK Kim, J Gatineau, H Kim
Journal of The Electrochemical Society 158 (10), G217-G220, 2011
532011
Degradation of the Deposition Blocking Layer During Area-Selective Plasma-Enhanced Atomic Layer Deposition of Cobalt
H Lee, J Kim, H Kim, W Kim, J Lee, I Hwang
Journal of the Korean Physical Society 56 (1), 104-107, 2010
482010
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