Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al2O3 Nanopatterns S Seo, BC Yeo, SS Han, CM Yoon, JY Yang, J Yoon, C Yoo, H Kim, Y Lee, ... ACS applied materials & interfaces 9 (47), 41607-41617, 2017 | 106 | 2017 |
Bending stability of flexible amorphous IGZO thin film transistors with transparent IZO/Ag/IZO oxide–metal–oxide electrodes YC Kim, SJ Lee, IK Oh, S Seo, H Kim, JM Myoung Journal of Alloys and Compounds 688, 1108-1114, 2016 | 62 | 2016 |
Comparative study of the growth characteristics and electrical properties of atomic-layer-deposited HfO 2 films obtained from metal halide and amide precursors IK Oh, BE Park, S Seo, BC Yeo, J Tanskanen, WH Kim, H Kim Journal of Materials Chemistry C 6 (27), 7367-7376, 2018 | 49 | 2018 |
Atomic layer deposition of a uniform thin film on two-dimensional transition metal dichalcogenides T Nam, S Seo, H Kim Journal of Vacuum Science & Technology A 38 (3), 2020 | 45 | 2020 |
Low-temperature, high-growth-rate ALD of SiO2 using aminodisilane precursor T Nam, H Lee, T Choi, S Seo, CM Yoon, Y Choi, H Jeong, HK Lingam, ... Applied Surface Science 485, 381-390, 2019 | 39 | 2019 |
Molecular oxidation of surface–CH3 during atomic layer deposition of Al2O3 with H2O, H2O2, and O3: A theoretical study S Seo, T Nam, H Kim, B Shong Applied Surface Science 457, 376-380, 2018 | 35 | 2018 |
Synthesis of a Hybrid Nanostructure of ZnO-Decorated MoS2 by Atomic Layer Deposition IK Oh, WH Kim, L Zeng, J Singh, D Bae, AJM Mackus, JG Song, S Seo, ... ACS nano 14 (2), 1757-1769, 2020 | 31 | 2020 |
Effects of O2 plasma treatment on moisture barrier properties of SiO2 grown by plasma-enhanced atomic layer deposition Y Lee, S Seo, IK Oh, S Lee, H Kim Ceramics International 45 (14), 17662-17668, 2019 | 22 | 2019 |
Hydrogen Barriers Based on Chemical Trapping Using Chemically Modulated Al2O3 Grown by Atomic Layer Deposition for InGaZnO Thin-Film Transistors Y Lee, T Nam, S Seo, H Yoon, IK Oh, CH Lee, H Yoo, HJ Kim, W Choi, ... ACS Applied Materials & Interfaces 13 (17), 20349-20360, 2021 | 20 | 2021 |
Moisture barrier properties of low-temperature atomic layer deposited Al2O3 using various oxidants T Nam, H Lee, S Seo, SM Cho, B Shong, H Kim Ceramics International 45 (15), 19105-19112, 2019 | 19 | 2019 |
Surface energy change of atomic-scale metal oxide thin films by phase transformation IK Oh, L Zeng, JE Kim, JS Park, K Kim, H Lee, S Seo, MR Khan, S Kim, ... ACS nano 14 (1), 676-687, 2020 | 16 | 2020 |
Simultaneous improvement of the dielectric constant and leakage currents of ZrO 2 dielectrics by incorporating a highly valent Ta 5+ element BE Park, IK Oh, JS Park, S Seo, D Thompson, H Kim Journal of Materials Chemistry C 6 (36), 9794-9801, 2018 | 15 | 2018 |
Bi-layer high-k dielectrics of Al2O3/ZrO2 to reduce damage to MoS2 channel layers during atomic layer deposition WJ Woo, IK Oh, BE Park, Y Kim, J Park, S Seo, JG Song, H Jung, D Kim, ... 2D Materials 6 (1), 015019, 2018 | 13 | 2018 |
Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films T Choi, S Yeo, JG Song, S Seo, B Jang, SH Kim, H Kim Surface and Coatings Technology 344, 12-20, 2018 | 12 | 2018 |
Reaction Mechanisms of Non-hydrolytic Atomic Layer Deposition of Al2O3 with a Series of Alcohol Oxidants S Seo, WJ Woo, Y Lee, H Yoon, M Kim, IK Oh, SM Chung, H Kim, ... The Journal of Physical Chemistry C 125 (33), 18151-18160, 2021 | 11 | 2021 |
Optical Reflection from Unforbidden Diffraction of Block Copolymer Templated Gyroid Films S Jo, T Jun, HI Jeon, S Seo, H Kim, S Lee, DY Ryu ACS Macro Letters 10 (12), 1609-1615, 2021 | 9 | 2021 |
MoS2 doping by atomic layer deposition of high-k dielectrics using alcohol as process oxidants WJ Woo, S Seo, T Nam, Y Kim, D Kim, JG Song, IK Oh, JH Lim, HJ Kim, ... Applied Surface Science 541, 148504, 2021 | 8 | 2021 |
Display Device and Fabricating Method Thereof HK Seunggi Seo, Il-Kwon Oh, Ho-Jin Kim, ChoongKeun Yoo, YongBaek Lee US Patent 10,396,309, 2019 | 8 | 2019 |
Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors Y Lee, S Seo, T Nam, H Lee, H Yoon, S Sun, IK Oh, S Lee, B Shong, ... Applied Surface Science 568, 150939, 2021 | 6 | 2021 |
Amorphous Ge-Se-S chalcogenide alloys via post plasma sulfurization of atomic layer deposition GeSe for ovonic threshold switch applications S Jun, S Seo, S Park, TH Kim, M Lee, SM Hong, T Kim, S Chung, T Lee, ... Journal of Alloys and Compounds 947, 169514, 2023 | 5 | 2023 |