Neutral beam-assisted atomic layer chemical vapor deposition apparatus and method of processing substrate using the same G Yeom, BJ Park, SW Kim, JT Lim US Patent 7,799,706, 2010 | 320 | 2010 |
Number of graphene layers as a modulator of the open-circuit voltage of graphene-based solar cell K Ihm, JT Lim, KJ Lee, JW Kwon, TH Kang, S Chung, S Bae, JH Kim, ... Applied Physics Letters 97 (3), 2010 | 95 | 2010 |
Efficient white organic light emission by single emitting layer YW Ko, CH Chung, JH Lee, YH Kim, CY Sohn, BC Kim, CS Hwang, ... Thin Solid Films 426 (1-2), 246-249, 2003 | 86 | 2003 |
A light scattering layer for internal light extraction of organic light-emitting diodes based on silver nanowires K Lee, JW Shin, JH Park, J Lee, CW Joo, JI Lee, DH Cho, JT Lim, MC Oh, ... ACS applied materials & interfaces 8 (27), 17409-17415, 2016 | 59 | 2016 |
Efficient large-area transparent OLEDs based on a laminated top electrode with an embedded auxiliary mesh S Park, JT Lim, WY Jin, H Lee, BH Kwon, NS Cho, JH Han, JW Kang, ... ACS Photonics 4 (5), 1114-1122, 2017 | 56 | 2017 |
Characteristics of SiO {sub x} N {sub y} films deposited by PECVD at low-temperature using BTBAS-NH {sub 3}-O {sub 2} JH Lee, CH Jeong, JT Lim, VA Zavaleyev, KS Min, SJ Kyung, GY Yeom Journal of the Korean Physical Society 48, 2006 | 56 | 2006 |
White-light-emitting devices based on organic multilayer structure JT Lim, NH Lee, YJ Ahn, GW Kang, CH Lee Current Applied Physics 2 (4), 295-298, 2002 | 45 | 2002 |
Flexion bonding transfer of multilayered graphene as a top electrode in transparent organic light-emitting diodes J Tae Lim, H Lee, H Cho, BH Kwon, N Sung Cho, B Kuk Lee, J Park, ... Scientific Reports 5 (1), 17748, 2015 | 43 | 2015 |
Polyimide surface treatment by atmospheric pressure plasma for metal adhesion JB Park, JS Oh, EL Gil, SJ Kyoung, JT Lim, GY Yeom Journal of The Electrochemical Society 157 (12), D614, 2010 | 41 | 2010 |
Efficient white light emitting devices with a blue emitting layer doped with a red dye JT Lim, MJ Lee, NH Lee, YJ Ahn, CH Lee, DH Hwang Current Applied Physics 4 (2-4), 327-330, 2004 | 41 | 2004 |
Top-emitting organic light-emitting diode using transparent conducting indium oxide layer fabricated by a two-step ion beam-assisted deposition JT Lim, CH Jeong, A Vozny, JH Lee, MS Kim, GY Yeom Surface and Coatings Technology 201 (9-11), 5358-5362, 2007 | 39 | 2007 |
Low angle forward reflected neutral beam source and its applications BJ Park, SW Kim, SK Kang, KS Min, SD Park, SJ Kyung, HC Lee, JW Bae, ... Journal of Physics D: Applied Physics 41 (2), 024005, 2008 | 34 | 2008 |
White top-emitting organic light-emitting diodes using one-emissive layer of the DCJTB doped DPVBi layer MS Kim, CH Jeong, JT Lim, GY Yeom Thin Solid Films 516 (11), 3590-3594, 2008 | 32 | 2008 |
Uniformity of internal linear-type inductively coupled plasma source for flat panel display processing JH Lim, KN Kim, JK Park, JT Lim, GY Yeom Applied Physics Letters 92 (5), 2008 | 28 | 2008 |
Anisotropic Etching of InP and InGaAs by Using an Inductively Coupled Plasma in Cl~ 2/N~ 2 and Cl~ 2/Ar Mixtures at Low Bias Power JW Bae, CH Jeong, JT Lim, HC Lee, GY Yeom, I Adesida JOURNAL-KOREAN PHYSICAL SOCIETY 50 (4), 1130, 2007 | 27 | 2007 |
White organic light-emitting diodes from three emitter layers MS Kim, JT Lim, CH Jeong, JH Lee, GY Yeom Thin Solid Films 515 (3), 891-895, 2006 | 26 | 2006 |
Effects of inductively coupled plasma treatment using O2, CF4, and CH4 on the characteristics of organic light emitting diodes CH Jeong, JH Lee, JT Lim, MS Kim, GY Yeom Surface and Coatings Technology 201 (9-11), 5012-5016, 2007 | 24 | 2007 |
Deposition of SiO2 by plasma enhanced chemical vapor deposition as the diffusion barrier to polymer substrates CH Jeong, JH Lee, JT Lim, NG Cho, CH Moon, GY Yeom Japanese journal of applied physics 44 (2R), 1022, 2005 | 24 | 2005 |
SiOxNy thin film deposited by plasma enhanced chemical vapor deposition at low temperature using HMDS–O2–NH3–Ar gas mixtures JH Lee, CH Jeong, JT Lim, VA Zavaleyev, SJ Kyung, GY Yeom Surface and Coatings Technology 201 (9-11), 4957-4960, 2007 | 23 | 2007 |
Characteristics of SiOxNy films deposited by inductively coupled plasma enhanced chemical vapor deposition using HMDS/NH3/O2/Ar for water vapor diffusion barrier JH Lee, CH Jeong, HB Kim, JT Lim, SJ Kyung, GY Yeom Thin Solid Films 515 (3), 917-921, 2006 | 23 | 2006 |